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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Industrial and engineering chemistry 22 (1983), S. 609-614 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Macromolecules 11 (1978), S. 1022-1027 
    ISSN: 1520-5835
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 4332-4335 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have prepared eutectic SnPb solder lines for electromigration study by a process of solder reflow into V-grooves etched on (001) Si wafer surfaces. They are thick lines and are highly reproducible. We report here results of lines of 100 μm in width and 150 to 800 μm in length, stressed by a current density of 2.8×104 A/cm2 at 150 °C in ambient. The accumulation of a large lump of solder, rather than hillocks of Sn and Pb, was observed at the anode, and depletions and voids were observed at the cathode. By measuring the volume of the lump, we have calculated the average effective charge number of electromigration in the eutectic solder to be 33, which is close to the reported value of 47 for self-electromigration in bulk Pb. Using x-ray dispersive analysis, we found that Pb is the dominant diffusing species. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 1208-1214 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This study investigates the effect of electromigration upon the interfacial reactions between the promising lead-free solders, Sn–Cu and Sn–Ag, with Ni substrate. Sandwich-type reaction couples, Sn–0.7 wt% Cu/Ni/Sn–0.7 wt% Cu and Sn–3.5 wt% Ag/Ni/Sn–3.5 wt% Ag, were reacted at 160, 180, and 200 °C for various lengths of time with and without the passage of electric currents. Without passage of electric currents through the couples, only one intermetallic compound Ni3Sn4 with ∼7 at. % Cu solubility was found at both interfaces of the Sn–0.7 wt% Cu/Ni couples. With the passage of an electric current of 500 A/cm2 density, the Cu6Sn5 phase was formed at the solder/Ni interface besides the Ni3Sn4 phase. Similar to those without the passage of electric currents, only the Ni3Sn4 phase was found at the Ni/solder interface. Directions of movement of electrons, Sn, and Cu atoms are the same at the solder/Ni interface, and the growth rates of the intermetallic layers were enhanced. At the Ni/solder interface, the electrons flow in the opposite direction of the Sn and Cu movement, and the growth rates of the intermetallic layers were retarded. Only the Ni3Sn4 phase was formed from the Sn–3.5 wt% Ag/Ni interfacial reaction with and without the passage of electric currents. Similar to the Sn–0.7 wt% Cu/Ni system, the movement of electrons enhances or retards the growth rates of the intermetallic layers at the solder/Ni and Ni/solder interfaces, respectively. Calculation results show the apparent effective charge za* decreases in magnitude with raising temperatures, which indicates the electromigration effect becomes insignificant at higher temperatures. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 1552-1557 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have activated heavily boron-doped and arsenic-doped silicon-on-insulator (SOI) strips by applying electrical current. The SOI strips were implanted with 40 keV BF2+ or As+ at a dosage of 5×1015 ions/cm2. Without postimplantation annealing, these implanted SOI strips can be activated by applying a current up to 1×106 A/cm2, the resistance decreased from 8.80 to 0.61 kΩ for a 10 μm wide, 50 μm long, and 0.2 μm thick n+ silicon strip, for instance. This reduction of resistance is close to that obtained by the conventional postimplantation annealing at 900 °C for 30 min. To separate the effect of Joule heating from that of current activation, the temperature of the SOI strips during the current activation has been measured by Pt sensors. The result indicates that the temperature rise due to Joule heating is low and cannot explain the observed activation. We conclude that implanted dopants in Si can be activated by current stressing. To confirm it, carrier concentration obtained by Hall measurement is presented. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 3882-3886 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We tested flip chip solder bonded Si samples under tensile and shear loading as a function of annealing time at 200 °C. The solder bump was eutectic SnPb and the underbump thin film metallization was Cu/Cr deposited on oxidized Si. We found that the failure mode is interfacial fracture and the fracture strength decreases rapidly with annealing time. From scanning electric microscope observations, the fracture occurs at the Cu–Sn/Cr interface. We conclude that it is the metallurgical reaction that has brought the solder into direct contact with the Cr surface. The weak joint is due to the spalling of Cu–Sn compound grains from the Cr surface, especially near the edges and corners of the joint. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 5703-5709 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Using thin film solder strips, we have investigated the electromigration of six different compositions of Sn–Pb solders at current density of 105 A/cm2 near ambient temperature. The six compositions are pure Sn, Sn80Pb20, Sn70Pb30, Sn62Pb38 (eutectic), Sn40Pb60, and Sn5Pb95. The eutectic alloy, with the lowest melting point and a high density of lamella interfaces, was found to have the fastest hillock growth. As composition moving toward the two terminal phases, the hillock growth rate decreases; but it increases again in pure Sn. The interface between Sn and Pb, being the fastest kinetic path of mass transport, also serves as the place to initiate hillock and void formation. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The microstructural and luminescent properties of sputtered GaN thin films preiiradiated and γ-ray irradiated were systematically investigated. Analytical results revealed that the increasing doses of γ rays could enhance the occurrence of more nitrogen vacancies, which not only created a prominent deep level luminescence but also destroyed the crystallinity of GaN thin films. For low dose of γ-ray irradiation [[less, double equals]4 Mrad (GaN)], evidence showed that by raising the irradiation dose, more associated Ga–H complexes would be effectively promoted, yielding an enhanced yellow band emission. However, for high dose of γ-ray irradiation [〉4 Mrad (GaN)], further higher doses of γ rays could lead to the dissociation of Ga–H complexes in GaN samples, resulting in a repressed yellow band emission. From both the Fourier transform infrared spectroscopy and yellow band emission results, it is strongly suggested that Ga–H complexes in the vicinity of N most probably act as the origin of yellow band emission in GaN material. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1520-5827
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of the American Chemical Society 109 (1987), S. 2449-2456 
    ISSN: 1520-5126
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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