ISSN:
1089-7623
Quelle:
AIP Digital Archive
Thema:
Physik
,
Elektrotechnik, Elektronik, Nachrichtentechnik
Notizen:
For thin film fabrication and surface modification, ion sources with high current, low energy, and broad beam are required. The source should be simple and reliable to operate, mechanically rugged, and highly productive for commercial use. To meet these requirements, a Hall effect plasma accelerator has been manufactured and tested. A beam energy of 200–300 eV and a beam current density of up to 10 mA/cm2 have been obtained with the source. Operational characteristics and possibility for industrial application are presented.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.1144959
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