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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 237-242 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The defect structures of GaAs film on (001) Si substrate tilted ∼3° towards the [110] direction were investigated by the high-resolution transmission electron microscopy. GaAs films were grown by the molecular beam epitaxy (MBE) on the Si (001) substrate by a modified two-step process, in which amorphous GaAs buffer layers were grown first. High-resolution electron micrographs show that stacking faults (and/or microtwins) are preferentially formed on the tilted step-rich surface, whereas misfit dislocations are preferentially formed on the flat surface. However, the difference in the defect density on the two cross sections is small. Between the observed 90° edge and 60° misfit dislocations the density of the latter is higher irrespective of the substrate tilt. This occurrence is explained by the difference in distribution of initial nucleating islands between the present and the conventional two-step MBE techniques.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 56 (1990), S. 448-450 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin films of GaAs on Si were grown by molecular beam epitaxy, which involves the solid phase epitaxial (SPE) growth of the amorphous GaAs buffer layer. A Rutherford backscattering minimum channeling yield of ∼9.4% has been obtained for a 0.8-μm-thick GaAs film. Cross-sectional transmission electron micrographs and reflection high-energy electron diffraction results have revealed that misfit dislocations are mostly confined to what used to be the buffer layer of ∼300 nm in thickness, and that the microtwins (and/or stacking faults) are mostly originated from the GaAs/Si interface and are generated during SPE growth.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 35 (2000), S. 655-660 
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The crystalline quality of InxAl1 − xAs (x = 0.52, 0.489, 0.476) layers grown by molecular beam epitaxy (MBE) on InP substrate at 520°C has been studied. From the double crystal x-ray diffraction and photoluminescence measurement, InxAl1 − xAs (x = 0.52, 0.489) layers have been found to reveal high quality crystallinity and excellent optical performance. Although the In0.489Al0.511As layer of thickness of 1.116 μm has a lattice mismatch of 0.23%, an excellent lattice coherency has been achieved. On the other hand, in the In0.476Al0.524As layer which has only a slightly larger lattice mismatch of 0.32%, stacking faults are observed. We have also observed the modulation contrast in planar view images obtained from transmission electron microscopy, which most likely arises due to the clustering of In or Al atoms. The modulation has a wavelength of about 8 nm independent of the lattice mismatch between the substrate and the epilayer.
    Type of Medium: Electronic Resource
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