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  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 53 (1988), S. 304-306 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A systematic study compares the quality of InP epitaxial layers grown by low-pressure organometallic vapor phase epitaxy (OMVPE) using triethylindium, phosphine, and tertiarybutylphosphine (TBP) sources. High quality InP layers are obtained with either phosphorus source for growth at a high V/III ratio. The full widths at half-maximum (FWHM) of the main 4 K photoluminescence peak from InP layers grown with phosphine and TBP sources are 1.1 and 1.3 meV, respectively. This 1.3 meV FWHM is the narrowest reported for InP grown by OMVPE with a nonhydride phosphorus source. High quality InP layers can be grown at a lower V/III ratio with the TBP source than with the phosphine source.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 1566-1568 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Ga0.5In0.5P grown lattice matched to GaAs by metalorganic chemical vapor deposition (MOCVD) exhibited domains of varying degrees of column III sublattice ordering. Continuous-wave photoluminescence spectra were single peaked and relatively narrow, but the peak wavelengths from samples grown at low (630–670 °C) temperatures varied strongly with excitation density at low measurement temperatures, while peak wavelength did not vary for high (775 °C) temperature growth. The half width was 6.5 meV in the latter case, the narrowest reported from MOCVD-grown Ga0.5In0.5P. Time-resolved photoluminescence of partially ordered GaInP at liquid-helium temperatures is reported for the first time. For samples grown at low temperatures, the spectral peak displayed a slow (τ(approximately-greater-than)1 μs) decay at low excitation density. The decay was more rapid (τ=1.8 ns) at higher excitations and at higher photon emission energies. Possible explanations discussed include spatial separation of carriers and trapping.〈squeeze;1.6p〉
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 910-912 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Ga0.47In.53As/InP quantum well structures grown by atmospheric pressure organometallic vapor phase epitaxy are characterized by high-resolution transmission electron microscopy (HRTEM) and 4 K photoluminescence (PL). Microdensitometer analysis of the HRTEM images shows GaInAs wells as narrow as 10 A(ring) with slightly asymmetric interface widths. The InP to GaInAs transitions occur within 200 monolayers while the GaInAs to InP transitions are 3–5 monolayers wide, probably due to As carryover. 4 K PL shows half-widths below 9 meV for quantization shifts up to 140 meV. PL peak shifts as large as 395 meV for the narrowest quantum wells are observed compared to bulk Ga0.47In0.53As.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 3212-3214 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence excitation spectroscopy at 9 K reveals that the absorption edge of Ga0.5In0.5P containing relatively ordered domains (grown at 670 °C) is near 1.93 eV, representing the band gap of this inhomogeneous material. Photoluminescence (PL) has been observed at energies lower than this absorption edge energy by up to 70 meV. Along with the unusually slow decay times previously measured, the low energy PL indicates spatially indirect recombination. Therefore PL alone cannot reliably determine the band gap of typical "ordered'' Ga0.5In0.5P samples. In contrast, the optical properties of relatively randomly ordered ("normal'') Ga0.5In0.5P (grown at 775 °C) are typical of a normal direct III-V semiconductor.
    Type of Medium: Electronic Resource
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