Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
66 (1995), S. 1560-1562
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Line and dot patterns with about a 100 nm period are exposed on poly-methyl methacrylate (PMMA) resist by electron holographic lithography with a W〈100〉 thermal field emission (TFE) gun and an electron biprism. Subsequent atomic force microscope (AFM) observation has confirmed that both patterns are successfully fabricated. This technique allows one to produce nanoscale periodic patterns simultaneously, whose spacing could be, in principle, comparable to a lattice spacing. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.113646
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