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Growth of fluorocarbon polymer thin films with high CF2 fractions and low dangling bond concentrations by thermal chemical vapor deposition (1996)

Limb, Scott J. ; Labelle, Catherine B. ; Gleason, Karen K. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 68 (1996), S. 2810-2812

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Thermal chemical vapor deposition was used to deposit fluorocarbon films with chemical resemblance to bulk polytetrafluoroethylene. X-ray photoelectron spectroscopy revealed that the films deposited from thermal decomposition of hexafluoropropylene oxide had fluorine to carbon ratios of 2.0 and CF2 fractions of 90% along with 10% of CF3 and CF moieties. Electron spin resonance results found the dangling bond density to be 1.2×1018 spins/cm3, low compared to conventional plasma polymerized films. Low dangling bond densities were achieved by using a clean source of CF2 in the absence of plasma source. © 1996 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.116332

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Molecular Design of Fluorocarbon Film Architecture by Pulsed Plasma Enhanced and Pyrolytic Chemical Vapor Deposition (1999)

Limb, Scott J. ; Lau, Kenneth K. S. ; Edell, David J. ; [et al.]

Springer

Plasmas and polymers 4 (1999), S. 21-32

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ISSN: 1572-8978

Keywords: Pulsed PECVD ; pyrolytic CVD ; HFPO ; fluorocarbon films ; PTFE

Source: Springer Online Journal Archives 1860-2000

Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology

Notes: Abstract Pulsed plasma enhanced chemical vapor deposition (pulsed PECVD) and pyrolytic chemical vapor deposition (pyrolyric CVD) of fluorocarbon films from hexafluoropropylene oxide (HFPO) have demonstrated the ability to molecularly design film architecture. Film structures ranging from highly amorphous crosslinked matrices to linear perfluoroalkyl chain crystallites can be established by reducing the modulation frequency of plasma discharge in plasma activated deposition and by eventually shifting mechanistically from an electrically activated to a thermally activated process. X-ray photoelectron spectroscopy (XPS) showed CF2 content increasing from 39–65 mol%. Fourier transform infrared spectroscopy (FTIR) showed an increasing resolution between the symmetric and asymmetric CF2 stretches, and a reduction in the intensity of the amorphous PTFE and CF3 bands. High-resolution solid-state 19F nuclear magnetic resonance spectroscopy (NMR) revealed an increasing CF2CF2CF2 character, with the pyrolytic CVD film much like bulk poly(tetrafluoroethylene) (PTFE). X-ray diffraction (XRD) patterns evidenced an increase in crystallinity, with the pyrolytic CVD film showing a characteristic peak at 2θ = 18° representing the (100) plane of the hexagonal structure of crystalline PTFE above 19°C.