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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 4189-4193 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Luminescence properties of GaSb-GaInAsSb isotype type-II heterojunctions with various dopings have been investigated. GaInAsSb n-type epitaxial layers were grown by liquid-phase epitaxy on Czochralski-grown N-type substrates with different tellurium concentrations. Two main luminescent peaks with mutual interchange of intensity and with wavelength shift were observed, both with temperature and excitation intensity. This effect is dependent on dopant concentration in the substrate, as well as in the layer. The explanation of this effect is based on the dominant role of double acceptor levels as final states for the luminescent transitions. A new band in the luminescence spectra was found which is interpreted as a tunneling recombination of the conduction electrons with the photoexcited holes trapped on native acceptors in the band-bending region at the GaSb side of the heterojunction.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 75 (1999), S. 2617-2619 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In p–n junctions based on c-Si:Er, we have observed strongly efficient excitation of erbium electroluminescence at 1.54 μm. Excitation of erbium ions is accompanied by strong recombination of free carriers indicating a participation of an Auger mechanism. A possible excitation mechanism is proposed which is the Auger recombination of electrons occupying the upper subband of the conduction band with free holes in the valence band, whereas the energy of the recombination process is transferred by Coulomb interaction to 4f electrons of an erbium ion transmitting it to the second excited state 4I11/2 (excitation energy 1.26 eV). The observed three-level excitation of erbium ions is promising for the development of a Si:Er laser. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 1815-1823 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Er-doped GaAs/AlGaAs structures were grown by the molecular beam epitaxy technique with concentrations of Er in the range 1017–2×1019 cm−3. Photoluminescence (PL) of Er3+ ions and Er-induced defects was studied at liquid helium and higher temperatures. A strong diffusion of erbium and interdiffusion of gallium and aluminum ions are observed [at the boundary of GaAs/AlGaAs quantum wells (QWs)] which leads at high erbium concentrations to degradation of the QW's and macroscopic (average) leveling of erbium and aluminum concentrations over the whole semiconductor structure. From high-resolution PL spectra the existence of three types of Er centers is deduced, which differ by positions of fine structure lines, PL lifetimes, and temperature dependence. The results indicate that these centers are accompanied by the appearance of three types of carrier traps with binding energies of 20, 50, and about 400 meV, respectively. The experiments show evidence that carriers captured into these traps control the Auger excitation of Er ions assisted by multiphonon emission of local phonons. Temperature quenching of erbium PL is controlled by depopulation of defect states in the case of Auger excitation via the most shallow hole trap (20 meV) and by competition of multiphonon nonradiative capture with the Auger transitions in the case of the deepest defect (400 meV). De-excitation processes of excited f electrons accompanied by generation of electron-hole pairs were also considered. Such processes are especially important in the case of resonance excitation. Besides erbium PL at 1.54 μm, PL of erbium ions was observed from upper excited states at 0.82 and 0.98 μm, which demonstrates the possibility of realizing a three-level scheme of light emission. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A comparison of the photoluminescence of Er-doped hydrogenated amorphous silicon and crystalline silicon a-Si:H(Er) and c-Si(Er), is presented. It is shown that a-Si:H(Er) exhibits efficient room-temperature photoluminescence at 1.537 μm which is as strong as the emission from optimized c-Si(Er) at 2 K. Most remarkably, there is practically no temperature quenching of the emission intensity in the range 2–300 K. The experiments suggest that the lifetime connected with the Er-induced emission is considerably shorter in a-Si:H(Er) than in c-Si(Er) which may be responsible for the different dependences of the photoluminescence intensity on the temperature, chopping frequency, and excitation power. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 72 (1998), S. 3326-3328 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The behavior of luminescence spectra and structural defects in single crystal Czochralski silicon after erbium implantation at 1 MeV energy and 1×1013 cm−2 dose with subsequent annealing at 1100 °C for 0.25–3 h in an argon or chlorine-containing ambience was studied by photoluminescence (PL), transmission electron microscopy, and chemical etching/Nomarski microscopy. We have found that annealing in the chlorine-containing ambience gives rise to dislocation loops and pure edge dislocations with dominant dislocation-related lines in the PL spectrum. Pure edge dislocations are responsible for the appearance of the lines. The Er-related lines due to the intra-4f shell transitions in the rare-earth ions dominate in the PL spectra and no structural defects are observed after annealing in argon. The observed differences in the optical and structural properties of Si:Er are associated with intrinsic point defects generated during the implantation and annealing. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 70 (1997), S. 240-242 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have observed strong room-temperature electroluminescence at 1.54 μm induced by erbium ions in amorphous hydrogenated silicon (a-Si:H). The device consisted of an Al/a-Si:H(Er)/n-c-Si/Al structure. A mechanism for electronic excitation of the erbium ions in the amorphous matrix is proposed that is based on defect-related Auger excitation. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1063-7826
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: Abstract The influence of oxygen on the photoluminescence (PL) of erbium (at 1.54 µm) in erbium-doped hydrogenated amorphous silicon (c-Si〈Er〉) is investigated. The a-Si:H〈Er〉 films studied are fabricated by cosputtering Si and Er targets using the technology of dc silane decomposition in a magnetic field. The oxygen concentration is varied from 1019 to 1021 cm−3 by increasing the partial pressure of oxygen in the chamber. It is shown that, as in the case of erbium-doped crystalline silicon (c-Si〈Er〉), oxygen has an effect on the intensity of the 1.54 µm photoluminescence in a-Si:H〈Er〉 films. The values of the erbium and oxygen concentrations at which the maximum Er PL intensity is observed are two orders of magnitude higher than in crystalline silicon. The increase in the Er PL intensity at room temperature and the weaker temperature dependence of the Er PL in comparison to c-Si〈Er,O〉 attest to the prospect of using a-Si:H〈Er〉 films in optoelectronic applications.
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 1063-7826
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: Abstract Effective Er photoluminescence is observed at room temperature in a-Si:H films doped with Er atoms through a gas phase using powdered Er(TMND)3 as a source of Er ions. It is shown that the conditions for deposition of the films and their subsequent annealing influence the photoluminescence intensity and its temperature dependence. The observed behavior is attributed to restructuring of the amorphous silicon matrix within an Auger excitation mechanism involving defects.
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1063-7834
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract A short review is presented of the erbium-ion excitation mechanisms in crystalline and amorphous silicon and of the processes governing thermal quenching of erbium luminescence in these materials, which draws both from the studies carried out by the present authors and from available literature data.
    Type of Medium: Electronic Resource
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  • 10
    ISSN: 1063-7834
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract Incorporation of erbium into GaAs/AlGaAs quantum-well structures in the course of their MBE growth has been shown experimentally to initiate effective Ga and Al interdiffusion and Er diffusion due to the erbium-induced enhanced vacancy formation. A mechanism for the formation of cation vacancies is proposed, which is based on the generation of local strains by the incorporating erbium. It is shown that erbium interacts with aluminum to produce in AlGaAs aluminum-enriched, erbium-containing clusters.
    Type of Medium: Electronic Resource
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