ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A new method for removing fine airborne particles using an UV/photoelectron method is investigated for low pressure conditions. In the UV/photoelectron method, particles are unipolarly charged by collision with ions, which are produced by photoelectrons emitted from an UV-irradiated Au film. The particles are collected on electrodes under a strong electric field. To investigate the particle collection efficiency, a test chamber of 53l in volume is used in the experiment. More than 95% of the particles are removed by the method where the chamber pressure is above 10 Torr and the particle diameter ranges from 200 to 400 nm. The results can be explained by the current charging theory of fine particles. This method can be used to design superclean spaces for the storage and handling of wafers, such as wafer stockers, wafer delivering systems, and vacuum load-lock chambers under conventional operating conditions. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1146111
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