ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
By means of a computer simulation the self-consistent charge transport with the current densities j(x,t), the respective charges ρ(x,t), field strengths F(x,t), and potential distributions V(x,t) in SiO2 layers are obtained as a function of the insulator depth x and the injection time t. The SiO2 layers are considered as open layers on silicon substrate or they are embedded in metal-oxide-semiconductor (MOS) structures. The given currents of primary electrons, the field-dependent ballistic currents of secondary electrons and holes as well as the Fowler–Nordheim injection of electrons from the substrate into the dielectric layer are taken into account. This method allows a defined charge storage and the explanation of complicated emission, charging-up, and breakdown processes within insulating layers during electron bombardment and/or high-field charge injection from adjacent electrodes, e.g., in MOS structures. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1330242
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