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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 5529-5531 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A graphical method is presented for Hall data analysis, including the temperature variation of activation energy due to screening. This method removes the discrepancies noted in the analysis of recently reported Hall data on Si(In).
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 3246-3252 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Passivation of point and extended defects in GaSb has been observed as a result of hydrogenated amorphous silicon (a-Si:H) treatment by the glow discharge technique. Cathodoluminescence (CL) images recorded at various depths in the samples clearly show passivation of defects on the surface as well as in the bulk region. The passivation of various recombination centers in the bulk is attributed to the formation of hydrogen-impurity complexes by diffusion of hydrogen ions from the plasma. a-Si:H acts as a protective cap layer and prevents surface degradation which is usually encountered by bare exposure to hydrogen plasma. An enhancement in luminescence intensity up to 20 times is seen due to the passivation of nonradiative recombination centers. The passivation efficiency is found to improve with an increase in a-Si:H deposition temperature. The relative passivation efficiency of donors and acceptors by hydrogen in undoped and Te-compensated p-GaSb has been evaluated by CL and by the temperature dependence of photoluminescence intensities. Most notably, effective passivation of minority dopants in tellurium compensated p-GaSb is evidenced for the first time. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 2847-2853 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The hole transport properties of gallium antimonide with various degrees of tellurium compensation have been investigated in the temperature range of 4.2–300 K. For the undoped GaSb, the p-type conductivity arises from a doubly ionizable native defect VGa GaSb. In the Te compensated samples, apart from the Te-donor level and the VGaGaSb center, an acceptor level resulting from complexation of VGa GaSb with TeSb has been found. This acceptor level lies ∼70 meV above the valence band edge. The concentration of this center depends on the melt composition and the level of Te present in the melt during growth of crystals. Most interestingly, at very low level of Te concentration, an additional triple native acceptor (VGa GaSb VGa) has also been observed. With the increase in Te concentration, the mobility decreases and a shift in the mobility peak to higher temperature is observed. The low-temperature mobility is limited by ionized impurity scattering. At higher temperatures, the scattering mechanisms depend on Te concentration in the sample. In this regime, significant contributions from acoustic, nonpolar optical, and polar optical phonon scattering are observed for samples with low levels of Te. In contrast, the impurity scattering dominates even at room temperature for highly compensated crystals. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 4825-4827 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Improvements in optical and electrical properties were observed after ruthenium passivation of gallium antimonide surfaces. On passivation, luminescence efficiency increased up to 50 times and surface state density reduced by two orders of magnitude. Also, the reverse leakage current was found to decrease by a factor of 30–40 times. Increase in carrier mobility as a result of grain boundary passivation in polycrystalline GaSb was observed. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 5398-5405 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of hydrogenation and thermal annealing on the photoluminescence (PL) of InP:Mg and InP:Zn is presented. On hydrogenation, a rise in near-band-edge PL intensity by a factor of 16 for the InP:Mg sample and a factor of 50 for the InP:Zn sample is observed and this is attributed to the passivation of nonradiative centers. A donor–acceptor pair transition before hydrogenation in the InP:Mg sample and after hydrogenation in the InP:Zn sample was observed. In both cases, the magnitude of the shift in peak position with excitation intensity shows the involvement of a donor deeper than the normally present shallow donors. The ionization energy of the donor in InP:Mg is estimated to be 48 meV and that in InP:Zn is estimated to be 〈40 meV. No hydrogenation induced radiative transitions were observed. In the InP:Mg samples, the acceptor passivation effects are lost after annealing at a temperature of 350 °C for 2 min, whereas the nonradiative center passivation after hydrogenation is not completely lost. In InP:Zn, the acceptor passivation along with nonradiative and deep center passivation are lost after an annealing treatment of 300 °C for 2 min. A thermally induced D–A pair emission in InP:Zn which moves to lower energies with increasing annealing temperature is observed. Such a transition is not observed for InP:Mg. This can be either due to a preferential pairing of the donor and acceptor which becomes randomized after the heat treatment or due to the removal of hydrogenation effects by annealing. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 8243-8245 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A deep-level transient spectroscopy (DLTS) technique is reported for determining the capture cross-section activation energy directly. Conventionally, the capture activation energy is obtained from the temperature dependence of the capture cross section. Capture cross-section measurement is often very doubtful due to many intrinsic errors and is more critical for nonexponential capture kinetics. The essence of this technique is to use an emission pulse to allow the defects to emit electrons and the transient signal from capture process due to a large capture barrier was analyzed, in contrast with the emission signal in conventional DLTS. This technique has been applied for determining the capture barrier for silicon-related DX centers in AlxGa1−xAs for different AlAs mole fractions.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 68 (1996), S. 1458-1460 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Fine structure has been observed in the 1.4 eV luminescence band of thin (≈100 A(ring)) amorphous silicon (a-Si:H) layers deposited on silicon substrates. The energy separation between the peaks is ≈20 meV. A similar luminescence band observed in layers grown on glass substrates under the same conditions is several orders of magnitude lower in intensity and is without perceptible fine structure. There is no change in the nature of the fine structure and the peak energies in films deposited at different substrate temperatures (150–300 °C). The dependence of the luminescence band on illumination intensity and on temperature has also been measured. This indicates probable excitonic nature of the luminescence. Possible causes for the observed phenomena are discussed. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 1001-1003 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hydrogenated amorphous silicon (a-Si:H) has been deposited on n- and p-GaSb by the plasma glow discharge technique. The electrical characteristics of metal/a-Si:H/GaSb structures are presented. The current transport in these structures is dictated by the barriers at the metal/a-Si:H and a-Si:H/GaSb interfaces and the series resistance of the bulk a-Si:H interfacial layer. Space charge limited current in the interfacial layer gives rise to a voltage dependent resistance and increases the forward "turn-on'' voltage. Furthermore, these structures exhibit extremely low reverse leakage currents and high reverse breakdown voltages. Significantly, rectifying junctions of a-Si:H/p-GaSb have been achieved with barrier heights of ∼0.4 eV. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 1449-1455 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrically active deep levels related to nickel in silicon are studied under different diffusion conditions, quenching modes, and annealing conditions. The main nickel-related level is at Ev+0.32 eV. Levels at Ev+0.15 and Ev+0.54 eV are not related to nickel while those at Ev+0.50 and Ev+0.28 eV may be nickel related. Their concentrations depend on the quenching mode. There is no nickel-related level in the upper half of the band gap. The complicated annealing behavior of the main nickel-related level is explained on the basis of the formation and dissociation of a nickel-vacany complex.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 6311-6314 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effects of the two sampling gate positions, and their widths and the integrator response times on the position, height, and shape of the peaks obtained in a double-channel gated-integrator-based deep-level transient spectroscopy (DLTS) system are evaluated. The best compromise between the sensitivity and the resolution of the DLTS system is shown to be obtained when the ratio of the two sampling gate positions is about 20. An integrator response time of about 100 ms is shown to be suitable for practical values of emission time constants and heating rates generally used.
    Type of Medium: Electronic Resource
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