ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The dependence of the Co anisotropy constants on the measurement temperature, deposition conditions, and underlayer materials was studied using unicrystal Co(101¯0)/Cr (or NiAl)(112)/Ag(110) films sputter deposited on hydrofluoric acid etched Si(110) substrates. The single, in-plane easy axis orientation in these films allows the direct determination of the anisotropy constants. The anisotropy constants of unicrystal Co films are smaller than those of a bulk Co single crystal, and the temperature dependence of the anisotropy constants is stronger. The K1 value drops by 50% as the temperature is increased from 25 °C to 75 °C, and then becomes negative at 135 °C. This zero-crossing temperature is considerably lower than the 250 °C at which K1 of a bulk Co single crystal decreases to zero. The anisotropy constants also vary with the film preparation substrate temperature. Applying a substrate bias during the Co deposition effectively increases K1 to near bulk material values. Unicrystal Co films grown on NiAl/Ag/HF–Si(110) show smaller K1 as compared to those on Cr underlayers. The addition of a thin Cr intermediate layer on the NiAl underlayer, however, restores K1 to the larger value obtained on Cr/Ag/HF–Si(110). © 2000 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.372874
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