ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
For the 1:1 laser projection lithography system used to achieve large-area patterning withhigher resolutions as well as higher throughput, the key parameters such as the laser beamgeometry, the numerical aperture of projection lens, the laser source power and the pulse repetitionrate are theoretically analyzed. It is expounded the process of uniform exposure in hexagonal beamshape, the advantages and limitations of 1:1 projection owing to numerical apertures deciding theresolution, as well as the cause of choosing larger laser power and pulse repetition rate. Meanwhile,the projection lens for a unit-magnification, refractive imaging system is tentatively simulationdesignedusing ZEMAX optical design software. The optimized three-dimensional layout is plotted.For the designed results, the maximum optical path difference is smaller thanλ /4 within entirevisual field. The resolution for feature sizes 10μm can be achieved within depth of focus 400μm byevaluating MTF. The maximum field curvature is within 10μm and the maximum distortion is smallthan 0.000007%. This fulfills the demands in technical specifications
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/56/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.364-366.533.pdf
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