Library

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 5095-5100 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This paper reports a current transport study on the P+/N AlxGa1−xAs homojunction diodes with the AlAs mole fraction, x, ranging from 0 to 0.66. From the 2-kT surface recombination current behavior, the surface state density is nearly independent of x as x is smaller than 0.2. On the other hand, as x is larger than 0.2, the surface state density decreases as x increases. A photocurrent-aided method is proposed to extract the embedded 1-kT current out of the series resistance effect. It is found that the 1-kT current follows Shockley diffusion theory, and the hole diffusion length has a drastic change in the transition region from direct to indirect band. A three-band diffusion model considering the Γ-band-electron-concentration-dependent hole lifetime has been proposed to explain the experimental results successfully.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 2140-2145 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Al0.05Ga0.95As/Al0.35Ga0.65As single- and multiple-quantum-well structures with well widths less than 20 A(ring) have been successfully fabricated by liquid-phase epitaxy using low-temperature, two-phase, and dummy wafer methods. The transmission electron microscope cross-section technique is applied to study the thickness variation of quantum well and the transition width at the heterojunction interface. An interesting phenomenon observed during liquid-phase epitaxy growth is that the interface of Al0.05Ga0.95As grown on Al0.35Ga0.65As is rather flat and sharp whereas the opposite growth sequence gives rise to a wavy interface. It is believed that the flat Al0.05Ga0.95As/Al0.35Ga0.65As interface is due to a tendency to deposit the epilayer when the Al0.05Ga0.95As solution is in contact with the Al0.35Ga0.65As substrate and the wavy Al0.35Ga0.65As/ Al0.05Ga0.95As interface is due to a tendency to dissolve the substrate when the Al0.35Ga0.65As solution is in contact with the Al0.05Ga0.95As substrate. The transition width is less than 10 A(ring) at the Al0.05Ga0.95As/Al0.35Ga0.65As interface but is about 30–50 A(ring) at the inverted Al0.35Ga0.65As/ Al0.06Ga0.95As interface. These values are about the same as those reported in the recent literature. The peak energy of the photoluminescence spectrum reveals the quantum size effect.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 2767-2772 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The well-known abnormal outdiffusion problem of heavily Be-doped GaAs prepared by molecular-beam epitaxy was found to be initiated by the shrinkage of the lattice constant of the (p+) GaAs epilayer. Through detailed investigation of the double-crystal x-ray spectra, van der Pauw measurements, photoluminescence, and infrared-absorption spectra of Be-doped GaAs for various doping concentrations, it is found that there exists a critical doping concentration, i.e., 2.6×1019/cm3, beyond which the lattice constant of the epilayer starts to shrink and the Be outdiffusion into the substrate is significantly enhanced. Apparently, the tensile stress on the epilayer results in the abnormal Be outdiffusion. The absorption coefficient of Be-doped GaAs in the 8–10 μm region with carrier concentration 8.3×1019/cm3 are found to be about 104 cm−1 which is useful for the application of this layer to a p+-type AlGaAs/GaAs heterojunction infrared detector.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 1766-1771 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The 2-kT current at the emitter-base heterojunction of AlGaAs/GaAs heterojunction bipolar transistor grown by liquid phase epitaxy is found to be much lower than that of a GaAs homojunction diode. By measuring spectral response and current-voltage characteristics of (n)AlxGa1−xAs-(p)Al0.05Ga0.95As diodes having a similar structure to the emitter-base heterojunction, it is found that the 2-kT surface recombination current is determined by the lower doped side of the heterojunction. Therefore, a higher 1- to 2-kT current ratio and thus higher current gain can be obtained when a high-band-gap emitter with lower doping concentration is used. It is also found that by inserting an undoped AlGaAs spacer layer in between the emitter-base heterojunction and applying an edge-thinning design, a high-gain heterojunction bipolar transistor can be routinely obtained.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 6230-6235 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Optical and structural properties of as-grown and annealed InAs(N)/InGaAsP strained multiple quantum-well (MQW) structures grown by gas source molecular-beam epitaxy are investigated by photoluminescence (PL), double crystal x-ray diffraction, and photoconductivity spectroscopies. Properties of the as-grown and annealed MQW's are studied and those of the InAs/InGaAsP MQW (C821) and the InAsN/InGaAsP MQW with the lowest nitrogen contents N=1.1% in the well (C822) are compared. For the C821 InAs/InGaAsP MQW with a very large total strain, a low energy shoulder, possibly induced by defects or impurities, can be seen in the low temperature PL spectrum, and a large density of nonradiative recombination centers is found. For nitrogen-containing MQW's, the PL full width at half maximum and PL peak evolutions with increasing annealing temperature are influenced by the alloy inhomogeneities. The initial redshift of the PL peak after rapid thermal annealing means that the luminescence is dominated by As-rich regions in these as-grown samples. Exciton localization induced by alloy disorders is also found in high-nitrogen-content samples. By comparing the experimental results of C821 and C822, adding a little nitrogen to reduce the rather large total strain in the structure is beneficial to structural and optical quality improvement. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 1634-1636 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The silicon doping of GaAs grown by metalorganic chemical vapor deposition using a silane source has been investigated. The amphoteric property of the Si dopant is demonstrated for the first time. It is found that the doping characteristics are strongly temperature dependent. At the growth temperature higher than 600 °C and the arsine to trimethylgallium mole ratio (AsH3/TMG) around 217, the conduction is n type and the carrier concentration increases as the temperature increases. On the other hand, when the growth temperature is lower than 600 °C, the carrier concentration increases as the temperature decreases and the conduction becomes p type at 400–450 °C. In addition, when the AsH3/TMG mole ratio is below 50, the Si-doped GaAs layers also become p type. The GaAs light-emitting diode is thus successfully fabricated using a single silicon dopant.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 3061-3064 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Self-organized InAs quantum dots (QDs) grown on both (100) exact and (100) misoriented 7° toward (110) GaAs substrates using gas source molecular beam epitaxy with V/III ratio ranging from 1.1 to 20 have been studied by photoluminescence (PL) measurements from 8.5 to 300 K. The QD structures grown on the misoriented substrates show a better uniformity than those grown on the exact substrates at the same growth conditions. Effects of AsH3 flow rate on the PL intensity, peak energy, and linewidth for QDs grown on both types of substrates are presented. Basically, higher AsH3 flow rate gives higher PL intensity at 8.5 K. At room temperature (300 K), on the contrary, lower AsH3 flow rate results in higher PL intensity. The study of thermal quenching energy reveals that the larger the dot size the better the PL intensity at 300 K. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 4006-4009 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Al0.35Ga0.65As/Al0.05Ga0.95As/Al0.35Ga0.65As quantum well structure with a 70-A(ring)-thick well has been successfully fabricated by liquid-phase epitaxy at 685 °C. The transmission electron microscope cross-section technique is applied to study the uniformity of the quantum well and the transition width at the heterojunction interface. An interesting phenomenon observed for the first time during liquid-phase epitaxy growth is that the interface of Al0.05Ga0.95As grown on Al0.35Ga0.65As is rather flat and sharp whereas the opposite growth sequence gives rise to a wavy interface. The transition width is less than 10 A(ring) at the Al0.05Ga0.95As/Al0.35Ga0.65As interface but is about 30–50 A(ring) at the inverted Al0.35Ga0.65As/Al0.05Ga0.95As interface. These values are much less than those reported in the literature. The peak energy of the photoluminescence spectrum reveals the quantum size effect.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 3976-3979 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Two device structures are presented for the solution of two problems that result when an AlGaAs heterojunction bipolar transistor is used in GaAs integrated circuits. The first is the 2-kT surface recombination current problem, which seriously reduces the current gain, especially at low current level. It is found that by sandwiching a high band-gap p-type AlGaAs in the emitter-base junction interface, the 2-kT current could be substantially reduced, and the current gain displays flattened characteristics at low collector current (〈1 μA). The second problem is how to reliably smooth out the potential spike at the base-collector interface which results in a serious voltage-dependent collector current in the common emitter I-V characteristics of the transistors. It is found that by adding a thin spacer layer with the same composition but the opposite type as the base layer in the base-collector junction interface, the potential spike can be easily and reproducibly suppressed.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 890-895 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The recent observation of an emitter-base potential spike explains the origin of the high offset voltage of the Npn Al0.5Ga0.5As/GaAs heterojunction bipolar transistor. A new model is proposed in the paper to explain the higher turn on voltage of the emitter-base junction caused by the potential spike. This model treats the current transport mechanism across a p-n heterojunction to be a balanced two-step process, i.e., thermionic emission followed by Shockley diffusion, instead of the conventionally believed one-step diffusion process. The correct procedures to extract the potential spike height from the measured offset voltage are also established.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...