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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 7701-7707 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In order to investigate the interface between polycrystalline-silicon (poly-Si) and crystalline silicon (c-Si), which is of crucial importance for the passivation of high-voltage devices, an infrared diagnostic method has been developed which is based on a modified attenuated total reflection configuration. This interface is shown to consist of silicon oxides (mainly SiO2) in the monolayer range with a thickness of 7±2 A(ring). The interpretation of the experimental results is based on a direct comparison of the infrared reflectivity spectrum of the interface to be studied with that of a reference sample containing a 100-A(ring) thick SiO2 interface layer, as well as on extensive computer calculations. Such calculations have been performed for a three-layer system as well as for a simplified system consisting of a single absorbing layer sandwiched between two transparent half-spaces. The latter system can be solved analytically and provides detailed insight into the physics of the interaction of light with the vibrational excitations of the interface layer. The existence and properties of such a silicon oxide interface layer are compatible with our secondary ion mass spectrometry experiments (oxygen segregation at the interface) and its thickness is in excellent agreement with the thickness of the amorphous interface layer observed by transmission electron microscopy.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 7690-7700 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The optical properties of semi-insulating polycrystalline silicon (SIPOS), i.e., SiOx with 0≤x≤2 are studied in the spectral range from the infrared to the UV region. The refractive index n(x,E) and the absorption coefficient α(x,E) are evaluated as a function of the oxygen content x and the photon energy E. The actual shape of the n(x) and α(x) curves are determined by two counteracting effects: (1) the increase of n(x) and α(x) caused by the transition from c-Si to a-Si of the Si grains in SIPOS in the range 0.02≤x≤0.2, and (2) the decrease of n(x) and α(x) due to the increasing insulating character of SIPOS with increasing x. The infrared vibrational modes of bulk SIPOS are described on the basis of an oscillator model with effective parameters. Both, the vibrational frequencies ν˜1(x) of the asymmetrical stretching motion and the total oscillator strength S˜(x) increase with increasing x. While ν˜1(x) can be qualitatively described on the basis of a simple mixture model, this is neither the case for the shape of the frequency-dependent conductivity σ(ν˜,x) nor for S˜(x). Both, σ(ν˜,x) and S˜(x) depend sensitively on the real defect structure consisting of Si grains embedded in the oxide matrix consisting of SiO2, SiO, and other suboxides.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 93 (1990), S. 4556-4559 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Excitation spectra of NaI were recorded in the wavelength range 239–256 nm with a frequency doubled pulsed dye laser. The assignment of 27 vibrational bands shows that the observed spectra belong to a new bound covalent state below the atomic asymptotes Na(2P1/2,3/2) + I(2P3/2) and above the predissociating state A0+ [S. H. Schaefer, D. Bender, and E. Tiemann, Chem. Phys. 89, 65(1984)]. The Dunham parameters and the potential curve for the new state are given. The potential curve is compared with that derived by the analysis of a fluorescence progression from a broadband excitation that was published recently by Bower et al. [J. Chem. Phys. 89, 4478 (1988)].
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 3337-3340 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thin C60 films have been deposited on mica(001) substrates by thermal evaporation at substrate temperatures between room temperature and 200 °C and at a constant deposition rate. The influence of the substrate temperature on the growth of C60-thin films has been systematically investigated by x-ray diffraction. θ–2θ measurements of the (111) peaks show a decrease of the full width at half-maximum (FWHM) with increasing substrate temperature, leading to a minimum FWHM of 0.15° for a substrate temperature of 200 °C. Oriented films with an out-of-plane mosaic spread of Δω=0.2° could be grown at a substrate temperature of 150±25 °C. It can be shown that the in-plane epitaxial arrangement C60(111)(parallel)mica(001) is determined by the seeding conditions and is independent of the substrate temperature. An increasing substrate temperature enhances the epitaxial alignment of the C60 crystals oriented with a {111} face parallel to surface and also the azimuthal alignment of the twins which are rotated by 60° about the surface normal.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 78 (2001), S. 192-194 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: It is shown that diamond nucleation on iridium buffer layers followed by an appropriate textured-growth step offers a viable way to realize single-crystal diamond films. Bias-enhanced nucleation on iridium layers results in heteroepitaxial diamond films with highly improved alignment. By a subsequent textured-growth step, the mosaicity can be further reduced for tilt as well as for twist in sharp contrast to former experiments using silicon substrates. Minimum values of 0.17° and 0.38° have been measured for tilt and twist, respectively. Plan view transmission electron microscopy of these films shows that, for low thicknesses (0.6 μm and 8 μm), the films are polycrystalline, consisting of a closed network of grain boundaries. In contrast, at the highest thickness (34 μm) most of the remaining structural defects are concentrated in bands of limited extension. The absence of an interconnected network of grain boundaries shows that the latter films are no longer polycrystalline. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Macromolecules 24 (1991), S. 3127-3135 
    ISSN: 1520-5835
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Macromolecules 24 (1991), S. 6725-6729 
    ISSN: 1520-5835
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 1520-5835
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 2074-2080 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The main problem associated with the use of aluminum as a p-type dopant in silicon power devices is its low electrical activity in silicon after the anneal process. In order to obtain a deeper insight into the possible mechanisms responsible for the loss of electrical activity, it is necessary to study three different states of the p-n junction fabrication: (1) the unimplanted starting or reference material; (2) the aluminum-implanted material; and (3) the implanted and annealed material. In this paper we present a detailed analysis of reflectivity and transmission measurements of the three different states extending from the far-infrared to the UV region, as well as depth profiles of the reflectivity from as-implanted and bevelled samples. From these investigations we have obtained information about two important aspects, namely lattice damage and free-carrier properties. The refractive index across the implanted layer is essentially constant and considerably larger than that of the crystalline state; together with recent transmission electron microscopy studies it is suggested that this change in refractive index is due to the formation of broken or weakened bonds. In the annealed state those defects induced by implantation which produce a change of the optical properties are healed out to a high degree. From the free-carrier absorption observed in the far-infrared direct information is obtained about the electrical properties, i.e., the mean concentration and mobility of the holes associated with the electrically active aluminum atoms in the thin p-type layer produced by annealing. We obtain an electrical activity (percentage of electrically active Al atoms) of 17%. This result is discussed and compared with recent sheet resistance-, spreading resistance-, and secondary-ion mass spectrometry data obtained from the same sample.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    The @International Journal Of Applied Radiation And Isotopes 26 (1975), S. 551-557 
    ISSN: 0020-708X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Energy, Environment Protection, Nuclear Power Engineering , Physics
    Type of Medium: Electronic Resource
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