Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
68 (1996), S. 1034-1036
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have used the force exerted on a neutral atom by an optical standing wave to focus a neutral atomic beam into a grating structure that is deposited on a substrate. We have made gratings with pitch of 294 nm, linewidths of δ=40–45 nm and contrast (approximately-greater-than)10:1, over an area of 7.6 mm2. We discuss the conditions needed to make the narrowest structures, and how these conditions affect the performance of this technique as a lithography tool. We also show depositions that have lower resolution, δ≈80 nm, but could cover an area greater than 3×104 mm2. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.116239
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