Library

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 4470-4474 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have studied the time response of visible, red photoluminescence in anodically etched p− silicon films. The principal features of our measurements are luminescence with two wavelength components, and a temperature dependent rise time of 24 μs and a decay time of 47 μs at room temperature. Results from our samples show some similarities to characteristics measured in amorphous Si, suggesting that some low-dimensional or disordered Si phase may play a role in the observation of visible light from this new photonic material.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A comprehensive, quantitative analysis is presented of the deformation behavior of coherently strained InAs/GaAs(111)A heteroepitaxial systems. The analysis combines a hierarchical theoretical approach with experimental measurements. Continuum linear elasticity theory is linked with atomic-scale calculations of structural relaxation for detailed theoretical studies of deformation in systems consisting of InAs thin films on thin GaAs(111)A substrates that are mechanically unconstrained at their bases. Molecular-beam epitaxy is used to grow very thin InAs films on both thick and thin GaAs buffer layers on epi-ready GaAs(111)A substrates. The deformation state of these samples is characterized by x-ray diffraction (XRD). The interplanar distances of thin GaAs buffer layers along the [220] and [111] crystallographic directions obtained from the corresponding XRD spectra indicate clearly that thin buffer layers deform parallel to the InAs/GaAs(111)A interfacial plane, thus aiding in the accommodation of the strain induced by lattice mismatch. The experimental measurements are in excellent agreement with the calculated lattice interplanar distances and the corresponding strain fields in the thin mechanically unconstrained substrates considered in the theoretical analysis. Therefore, this work contributes direct evidence in support of our earlier proposal that thin buffer layers in layer-by-layer semiconductor heteroepitaxy exhibit mechanical behavior similar to that of compliant substrates [see, e.g., B. Z. Nosho, L. A. Zepeda-Ruiz, R. I. Pelzel, W. H. Weinberg, and D. Maroudas, Appl. Phys. Lett. 75, 829 (1999)]. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 61 (1992), S. 2896-2898 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Bright visible photoluminescence (PL) has been measured in stain-etch silicon films prepared by chemical etching in a dilute hydrofluoric and nitric acid solution. The PL emission is observed to degrade exponentially when the stain-etch films are illuminated in air (intensity decreases by 1/e over 22.45 min). Anodic-etch silicon films, prepared using a novel electrochemical cell, show similar strong visible PL but a degradation rate an order of magnitude smaller. The wavelength of the PL peak for anodic-etch silicon (650–710 nm) shifts toward the blue with decreasing electrolyte HF concentration while the PL peak position of stain-etch silicon (∼650 nm) does not vary with process conditions investigated.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 3017-3019 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The mechanical behavior of thin buffer layers for InAs/GaAs(111)A heteroepitaxy has been investigated by x-ray diffraction (XRD). XRD θ–2θ spectra are presented for the (220) reflection for two monolayers (MLs) of InAs deposited on GaAs buffer layers of both 20 ML and 150 nm (≅ 460 ML) in thickness. For the thicker buffer layer, the XRD spectrum exhibits a single, symmetric peak at a reflected angle corresponding to the bulk GaAs lattice parameter, while for the thinner one it exhibits asymmetry around the GaAs substrate reflection with the spectrum tailing to lower angle. This indicates that the thin buffer layer possesses a distribution of interlayer distances in the [220] direction that are larger than that of the GaAs substrate. The XRD data agree very well with theoretical calculations in which the thin GaAs buffer layer is modeled as unconstrained at its base. Our results provide direct evidence that thin GaAs buffer layers behave mechanically similarly to compliant substrates. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 75 (1999), S. 829-831 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The surface morphology of InAs films grown on GaAs(111)A has been studied by scanning tunneling microscopy. The vertical surface displacement on the InAs films has been found to depend on the underlying GaAs buffer layer thickness: specifically, thin GaAs layers are observed to behave mechanically similar to compliant substrates. Atomistic simulations within a valence force field model have been used to compare quantitatively how the InAs surface morphology depends on film thickness and the underlying GaAs layer thickness. The experimental and theoretical results are in excellent agreement over a range of film thicknesses where the misfit dislocation network at the semicoherent InAs/GaAs interface is fully developed. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...