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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 1057-1071 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A study of the electrical and optical properties of the Se deep donor states in AlxGa1−xAs:Se grown by metalorganic vapor phase epitaxy (MOVPE) process is reported. A novel experimental technique is presented to determine the absolute energy and the true density of the deep donor. The characteristics of the Se deep donor states are obtained from deep level transient spectroscopy, photoluminescence, photocapacitance, Hall effect measurements, isothermal capacitance transient measurements, and a quasistatic capacitance voltage technique. It is found that the Se dopant gives rise to at least two energy levels in the band gap. One is the generally observed deep donor level, commonly called the DX level and the other is a new shallower donor state which also exhibits DX-like properties. The concentration of the shallower state is less than 5% of the deep donor density. The densities of both donors increase with the mole fraction of H2Se used during MOVPE growth. Thermal emission activation energies of 0.29±0.01 and 0.24±0.01 eV were found for the deep and shallower donor states, respectively, for 0.23≤x≤0.41. The Se donor ionization energies relative to the Γ minimum are determined for samples with different AlAs mole fractions, and also, the true densities of Se donors are obtained. We propose a macroscopic model for the emission and capture mechanisms of Se donors in AlxGa1−xAs, which allows a consistent interpretation of the results obtained by different measurement techniques and provides a natural explanation for the low temperature Hall density saturation phenomenon and the persistent photoconductivity effect.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 56 (1990), S. 177-179 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report a new analysis technique to determine the acceptor density NA and the donor density ND in high-purity GaAs from 10 K photoluminescence (PL) measurements. For both n-type and p-type samples, we find that NA/ND is related to the excitonic intensity ratio rx=I(A0,X)/I(D0,X) by NA/ND=0.89rx−0.06. In addition, NA can be determined from NA=1014IA, where IA is the emission intensity of the donor-acceptor pair transition normalized to the intensity of the unresolved exciton peak. Therefore, for n-type and p-type material with an impurity density 1013–1016 cm−3, NA and ND can be determined solely from a 10 K PL measurement. The advantage of this technique lies in its nondestructive nature and its applicability to situations where Hall measurements are not possible or suitable.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 1120-1122 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial layers of GaAs with peak mobilities as high as 200 000 cm2/V s at 50 K have been grown in an atmospheric pressure organometallic vapor phase epitaxy reactor using trimethylgallium (TMG) and arsine. The growth conditions which lead to high-mobility GaAs are described in this letter. Low-temperature photoluminescence and temperature-dependent Hall measurements are used to study the dependence of the incorporation of residual impurities on the growth temperature and arsine partial pressure. Carbon acceptor densities 〈1014 cm−3 were measured in the highest purity samples.
    Type of Medium: Electronic Resource
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