ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
It has been shown that it is possible to produce near diffraction limited images with soft x rays of wavelength 13.8 nm using normal incidence Si/Mo-multilayered coated optics. Initial experiments with a 20X reduction Schwarzschild optic produced features as small as 50 nm. It is considered that soft x-ray projection lithography may be a likely candidate for the future generation of lithographic tools needed to produce 0.1-μm features for integrated circuits around the turn of the century.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1142648
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