Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
69 (1996), S. 514-516
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Low resistance metallic contacts have been realized on n-type doped CdTe and CdZnTe layers grown by molecular beam epitaxy. The n-type doping of the layers was achieved using iodine or indium as a dopant. The metal/II–VI semiconductor heterostructures were realized with neodymium that was found to grow coherently on CdTe and CdZnTe substrates, with formation of a reacted compound at the interface. This interfacial layer is noted IL(Nd). The specific contact resistance, ρc, of the Nd/IL(Nd)/n-CdTe and Nd/IL(Nd)/n-CdZnTe heterostructures was measured using the transmission line model. The best result of 2.5×10−5 Ω cm2 is obtained for Nd/IL(Nd)/n-CdTe and for a doping level of about 6×1018 cm−3. An exponential increase of the ρc value is found when increasing zinc concentration in the CdZnTe alloys. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.117771
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