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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 4981-4989 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present a model for the calculation of homoepitaxial film growth rates during silicon deposition on Si(100)-2×1 from disilane. Central to this model is the use of thermalized gaseous disilane adsorption probabilities that have been determined as a function of gas and surface temperature by convoluting supersonic molecular beam adsorption probability data with a Maxwell–Boltzmann distribution of incident kinetic energies and angles. These calculations show that the primary adsorption pathway over the entire range of conditions investigated is the so-called trapping-mediated mechanism, in which dissociative chemisorption occurs via a physisorbed intermediate. A second adsorption mechanism, direct chemisorption, is activated by translational energy and does in fact contribute somewhat to adsorption, but only at high gas and surface temperatures. Hydrogen coverages and silicon film growth rates are calculated from a simple surface decomposition kinetic model together with a phenomenological thermal desorption model and compare favorably to experimental measurements. Under conditions of high flux or low surface temperature, the growth rate is limited by hydrogen desorption and therefore increases with increasing surface temperature. In the flux-limited or adsorption-limited growth regime, the growth rate is predicted to decrease with increasing surface temperature due to a drop in the adsorption probability, resulting in a maximum in the growth rate for a given set of deposition conditions. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 113 (2000), S. 2470-2478 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Disilane adsorption probabilities have been measured on Si(100)-2×1 over a wide range of incident kinetic energies, incident angles, and surface temperatures using supersonic molecular beam techniques. The trapping-mediated chemisorption mechanism is shown to be the dominant adsorption pathway under the conditions investigated. The first step in such a mechanism, namely trapping into the physical adsorption well, has been studied directly via measurements at a surface temperature of 77 K. As expected, the trapping probability drops with increasing kinetic energy, but nearly 50% of incident molecules trap at 1 eV incident energy, indicating that trapping is quite efficient over a wide range of translational energies. Chemisorption probability values measured at higher surface temperatures are fit to a simple trapping-mediated chemisorption model that can be used to predict adsorption probabilities over a wide range of conditions. Measurements of the chemisorption probability at 500 K are independent of incident angle at kinetic energies of 0.75 eV and below. However, trapping probabilities measured at 77 K are shown to decrease with increasing angle of incidence at kinetic energies of 0.6 eV and above. This unusual effect is discussed in terms of molecular scattering during parallel momentum accommodation. In order to investigate the effect of surface hydrogen formed as a result of disilane decomposition, adsorption probabilities were measured as a function of monohydride coverage as well. On a monohydride-saturated surface the trapping probability is found to be lower than on a bare surface, most likely due to a decreased disilane physical adsorption binding energy compared to the bare surface. Also, the trapping probability varies linearly with hydrogen coverage between bare-surface and monohydride-saturated values. On the other hand, the hydrogen coverage dependence of the chemisorption probability is found to follow a simple second-order kinetic scheme based on chemisorption occurring at two vacant surface sites. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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