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  • 1
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 1711-1715 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Current transport and instability mechanisms in thin film diodes with nonstoichiometric silicon nitride (a-SiNx:H) semiconducting layers have been investigated. In common with amorphous silicon thin film transistors the electrical characteristics of these diodes have been found to drift during use. We found that the initial current-voltage characteristics are related to the choice of interfacial treatments. This is explained by trapping of electrons at interface defect states and by tunneling of electrons into the conduction band via these states. We have also found a relationship between the initial characteristics of the diodes and the rate of drift due to electrical stressing. A threshold exists below whose drift is independent of the current-voltage characteristics and above which there is a strong dependence. This dependence of drift on current-voltage characteristic is consistent with field enhanced defect creation in the a-SiNx:H layer. © 1997 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 2978-2980 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: It is shown that the drift in the current–voltage characteristics of silicon-rich amorphous silicon nitride metal–semiconductor–metal diodes can be explained by a mechanism whereby electron trapping centers are created via hole–electron recombination. A first order model which includes excitation of holes by hot electrons moving into the anode and recombination of electrons with holes trapped in the valence band tail is in good quantitative agreement with the measured dependencies between drift, device thickness, current density, time, and charge passed through the device. © 1994 American Institute of Physics.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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