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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1357-1364 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Localized {100} fiber textured diamond films were grown by addition of 20–200 ppm nitrogen into the gas phase during hot-filament chemical-vapor deposition (CVD). Cathodoluminescence indicates the presence of the nitrogen-vacancy system in the {100} textured diamond, whereas a blue "band A'' luminescence is normally observed in diamond films grown without nitrogen addition. The results demonstrate that the nature of the substrates used for growth has no appreciable influence on the {100} texture, which implies that this fiber texture is obtained by competitive growth and selection of facets. The interaction of nitrogen with the {100} surface is a highly important factor in this process. Homoepitaxial growth shows that the addition of a small amount of nitrogen greatly enhances the growth rate of the {100} faces, making 〈100〉 the fastest growth direction in comparison with the 〈110〉 and 〈111〉 directions. This is attributed to breaking of a part of the dimers on the (2×1) reconstructed {100} surface by nitrogen compounds. The {100} texture in narrow, ring-shaped areas on diamond layers grown by the flame technique can also be attributed to the occurrence of a certain amount of nitrogen in the gas phase. It is demonstrated that the flame grown polycrystalline diamond layers have morphologies and cathodoluminescence features that are consistent with those observed in the hot-filament CVD diamond films grown with the addition of nitrogen. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2376-2384 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The homoepitaxial deposition of diamond layers on {111} and {001} type-IIa natural diamond substrates, by both laminar and turbulent acetylene-oxygen flames, is described. Using the same gas flows, temperatures, and supersaturations of 4%, a higher growth rate was obtained on a {001} substrate with a turbulent flame than with a laminar flame. Layers grown at the same temperature on {111} substrates with a supersaturation of 3% show no significant difference in growth rate. Due to the large differences in geometry between both types of flames it is not possible to relate the substrate positions in the acetylene feathers to each other and compare the growth results at any location. However, it is shown that the application of turbulent flames for single-crystal growth does not lead to a dramatic change in quality of the diamond as was previously reported in the literature. It is demonstrated by microscopic and spectroscopic techniques that the crystallographic orientation of the substrates, the deposition temperature, and the gas velocity all have a larger influence on the crystal morphology and impurity incorporation of the grown single crystals than the introduction of turbulence. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 2131-2133 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Centimeter sized, crack-free single crystal InGaP films of 1 μm thickness were released from GaAs substrates by a weight-induced epitaxial lift-off process. At room temperature, the lateral etch rate of the process as a function of the applied Al0.85Ga0.15As release layer thickness was found to have a maximum of 3 mm/h at 3 nm. Using 5-nm-thick AlAs release layers, the etch rate increased exponentially with temperature up to 11.2 mm/h at 80 °C. Correlation of the experimental data with the established theoretical description of the process indicate that the model is qualitatively correct but fails to predict the etch rates quantitatively by orders of magnitude. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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