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  • 1
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 590 (Aug. 2008), p. 101-116 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Silicon-On-Insulator (SOI) technology exhibits significant performance advantages overconventional bulk silicon technology in both electronics and optoelectronics. In this chapter wepresent an overview of recent applications on light emission from SOI materials. Particularly, in ourwork we used SOI technology to fabricate light emitting diodes (LEDs), which emit around1130 nm wavelength with an external quantum efficiency of 1.4 × 10−4 at room temperature(corresponding to an internal quantum efficiency close to 1 %). This is almost two orders ofmagnitude higher than reported earlier for SOI LEDs. This large improvement is due to three carrierconfinement mechanisms: geometrical effects, quantum-size effects, and electric field effects. Ourlateral p+/p/n+ structure is powered through two very thin silicon slabs adjacent to the p+/p and n+/pjunction. Such use of thin silicon films aims to reduce the p+ and n+ contact area and to confine theinjected carriers in the central lowly doped p-region. With this approach, we realized an efficientcompact infrared light source with high potential switching speed for on-chip integrationapplications
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Solid state phenomena Vol. 131-133 (Oct. 2007), p. 303-308 
    ISSN: 1662-9779
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Physics
    Notes: Luminescence properties of silicon light emitting diodes with engineered dislocation loops wereinvestigated. Dislocation loops were formed by Si+-ion implantation above and below metallurgicalp+-n junction followed by an annealing step. The diodes showed characteristic dislocation (D-band)and band-to-band luminescence. Measurements of carrier-injection level dependence of the D-bandsignal intensity were performed. The results are in agreement with the model for dislocationluminescence, which suggests rediative transition between two, dislocation-related shallow levels.A gradual blue-shift of the D-band peak positions was observed with an increase in the carrierinjection level in electroluminescence and photoluminescence. A supposition about existence ofstrong Stark effect for the excitonic dislocation states allows explaining the observations. Namely,in the build-in electric field of the p-n junction the exciton energies are red-shifted. The injectedcharge carriers lower the field and thus cause the blue-shift of the peak positions. A fitting of thedata using the quadratic Stark effect equation suggests 795 meV for the spectral position of D1 peakat 300 K and 0.0186 meV/(kV/cm)2 for the characteristic constant
    Type of Medium: Electronic Resource
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