Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
58 (1991), S. 2006-2008
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The growth of GaInAsP lattice matched to GaAs by organometallic vapor phase epitaxy using ethyldimethylindium and tertiarybutylphosphine is reported for the first time. The composition of the films is approximately Ga0.87In0.13As0.75P0.25, giving a band gap of about 1.52 eV. Intrinsic films are n type. Both n- and p-type doped layers have been prepared. Photoluminescence measurements on intrinsic films give spectral half widths of about 70 meV. Capping the films with AlGaAs window layers and using n+-n, high-low junctions at the GaInAsP/GaAs interface greatly improve the photoluminescent properties. A minority-carrier lifetime of 35 ns in an intrinsic film has been measured and suggests that the quaternary is equivalent to AlGaAs with the same band gap.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.105022
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