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  • 1
    Electronic Resource
    Electronic Resource
    Ion energy distributions on surfaces exposed to plasmas: An experimental and theoretical investigation (1992)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 3330-3340 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The plasma sheath is a space region between a plasma and the surface of a solid next to the plasma. The plasma sheath influences the plasma assisted deposition processes of thin films. It is also a determining factor for particle extraction as a plasma diagnostic tool. Ions were extracted from a plasma, produced by a dc hollow cathode discharge. The extracted ions were mass analyzed and simultaneously their energy distributions were measured. During each experiment, the discharge parameters were kept constant, whereas the sheath voltage and therefore the thickness of the sheath in front of the extraction orifice was varied. In this way the influence of the sheath on the composition of the ion flux and on the energy distributions of the various ion species could be observed. The gases used were hydrogen, hydrogen-argon, and hydrogen-silan mixtures in the pressure range of 0.08–1 mbar. The ion current densities were about 1 mA/cm2 and the sheath voltages were varied from floating potential to 160 V. A numerical model was developed to calculate the potential distribution in the sheath and the energy distributions of the various ion species. These calculations were done by an iterative method to obtain a self consistent solution. By comparing the results of the calculations with the measured ion energy distributions and ion intensities, conclusions about collision processes of ions and neutrals could be made. The investigations show that due to collision processes, the composition of the ion flux passing the sheath is considerably changed and the energy distributions of the various ion species can be explained by a few simple collision processes.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.351454
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  • 2
    Electronic Resource
    Electronic Resource
    Determination of atomic hydrogen densities in gases by a deuterium based Lyman-alpha absorption method (1996)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 2060-2068 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We discuss the variant of a method for the determination of absolute hydrogen atom densities based on the absorption of the hydrogen Lyman-alpha line. Previously, we demonstrated that by using a simple vacuum ultraviolet spectrometer with low resolution an accuracy of better than 50% for the determined hydrogen atom densities can be obtained for transmissions ranging from 10% to 90%. For transmissions outside of this range excessive errors occur, thus, limiting the usefulness of the method to a certain range of hydrogen atom densities, depending on absorber length and temperature. This range of atomic hydrogen densities accessible to the measurement can be extended by the new method that consists of using well-defined mixtures of hydrogen and deuterium in the absorber. Using a source of either hydrogen or deuterium Lyman-alpha radiation, only one sort of atoms contributes to the absorption. Thus, by selecting an appropriate mixture of hydrogen and deuterium, the range of atom densities accessible to the measurement can be extended to higher densities. Using well-defined mixtures ranging from 1% hydrogen in deuterium to 2% deuterium in hydrogen as absorbers, we were able to determine hydrogen atom densities up to a factor 100 higher than those measured previously in pure hydrogen. Using mixtures down to the natural abundance of deuterium in hydrogen, the measurement of even higher atom densities seems possible. The effect of the difference of the energies of dissociation of hydrogen and deuterium has been investigated using a computer model of relevant chemical processes. In most situations, this effect is smaller than the experimental error. The main limitation of the method is its sensitivity to absorption by impurities, as many molecular gases absorb Lyman-alpha radiation. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.363099
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  • 3
    Electronic Resource
    Electronic Resource
    Study of a Pulsed DC Glow-Discharge Used for Plasma-CVD with an Ultrafast Videosystem and a Langmuir-Probe (1998)
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 287-288 (Aug. 1998), p. 299-302 
    Details
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
    URL: http://www.tib-hannover.de/fulltexts/2011/0528/02/03/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.287-288.299.pdf
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  • 4
    Electronic Resource
    Electronic Resource
    Spectroscopic Ellipsometry as a Tool for On-Line Monitoring and Control of Surface Treatment Processes (2006)
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 518 (July 2006), p. 423-430 
    Details
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Modern material technology relies increasingly on processes for surface modification andcoating. Generally, we are lacking a possibility to monitor the progress of such processes. Thus theoutcome can only be analyzed after the end of the whole process cycle. We are proposing to usespectroscopic ellipsometry (SE) as an on-line monitoring tool. SE, as an optical method, is notaffected by high temperatures, process gases, plasmas, etc. It can be used as a monitoring tool or asensor for closed loop control of processes. The main difficulty is the on-line interpretation of SEdata. Depending on the nature of the process monitored or controlled, different models are used forthe interpretation. These models predict the SE response depending on different parametersdescribing the surface under investigation. A fitting process is used to solve the inverse problem,i.e. extracting material data from the SE spectra. We expect increased process stability and shorterdevelopment time as a practical benefit from the use of SE
    Type of Medium: Electronic Resource
    URL: http://www.tib-hannover.de/fulltexts/2011/0528/02/13/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.518.423.pdf
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  • 5
    Electronic Resource
    Electronic Resource
    Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N (1993)
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 140-142 (Oct. 1993), p. 439-456 
    Details
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
    URL: http://www.tib-hannover.de/fulltexts/2011/0528/02/00/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.140-142.439.pdf
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  • 6
    Electronic Resource
    Electronic Resource
    Interfaces for data processing in surface analysis (1998)
    Springer
    Fresenius' journal of analytical chemistry 360 (1998), S. 143-147 
    Details
    ISSN: 1432-1130
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract As computer controlled instruments for surface analysis are in common use for many years, the problem of exchangeability of analytical data has attracted interest in the surface analysis community. More and more examples for the development of standarized data formats as the VAMAS format [1] and the Standard for Chromatography Data Communication from the AIA [2] have been published. There are a few attempts to establish standardized “data dictionaries” e.g. the parameter lists describing AES and XPS spectra pusblished in Surface Science Spectra [3, 4]. If several different analysis methods (such as AES, SAM, XPS, SIMS, STM, AFM, EPMA, …) are applied to the same sample, a quite independent and open approach is needed to be able to combine data of various instruments in a common data evaluation procedure. It could be the basic concept of real mutli-method analysis. The public domain software package MAXMIND has been developed, as only a standardized data exchange and storage format based on data dictionaries can guarantee a high level of independence of proprietary measurement systems.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s002160050664
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  • 7
    Electronic Resource
    Electronic Resource
    On the plasma chemistry of the C/H system relevant to diamond deposition processes (1996)
    Springer
    Plasma chemistry and plasma processing 16 (1996), S. 173-185 
    Details
    ISSN: 1572-8986
    Keywords: Diamond synthesis ; atomic hydrogen ; modeling ; mass spectrometry ; pulsed rf discharge
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The chemistry of hydrogen-rich hydrocarbon-hydrogen mixtures is of primary interest for the understanding of the low-pressure synthesis of diamond. We per formed experiments under well-defined conditions like temperature, pressure, initial gas composition, etc. The gas composition at the end of a flow reactor was analyzed by a calibrated mass spectrometer and compared to results obtained from the Chemkin computer code. Residence thne in the reactor as well as other process parameters were similar to those of diamond-growing PA CVD processes performed earlier with the same experimental set-rip. Modeling and experiment under isothermal conditions show quantitative agreement. We realized time-resolved mass .spectrometry by means of a helium-flushed gas sampling probe. There is evidence that the commonly used reaction kinetic data for the dissociation C2H6 (+ M) ⇔ 2CH,(+M) gives 2 too small C2H4 concentrations for hydrogen-rich conditions. This could be attributed to the poorly known third-body efficiencies of the H2 molecules compared to Ar or C2H6 from which kinetic data are commonly derived.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01570176
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  • 8
    Electronic Resource
    Electronic Resource
    Study of the cobalt diffusion in CVD-layers by scanning Auger microscopy (SAM) (1987)
    Springer
    Fresenius' Zeitschrift für analytische Chemie 329 (1987), S. 355-360 
    Details
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Summary Multilayers of TiC/Al2O3/TiC were deposited by CVD (Chemical Vapor Deposition) on pure cobalt, cemented carbides (WC-Co) and Al2O3 substrates. By a low angle cut produced with a ball cratering technique, depth profile measurements were determined by SAM. In the case of the cobalt substrate, the cobalt concentration in the first TiC layer was greater than 10 at %. For the cemented carbide substrate, an enrichment at both interfaces of the first TiC layers was clearly detected. This occurred by diffusion of Co during the cleaning of the hot (1050 ° C) CVD reactor with hydrogen while no CVD deposition occurred. A thin Al2O3 layer (0.5 μm) proved to be a very efficient diffusion barrier for cobalt. The cobalt diffusing from the substrate acted as accelerator and grain refining agent for the TiC CVD deposition.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00469171
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  • 9
    Electronic Resource
    Electronic Resource
    Deconvolution of STM images using entropy as a regularization functional (1995)
    Springer
    Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 439-442 
    Details
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract The Maximum Entropy approach is applied to restore and sharpen scanning tunneling microscopy (STM) images with atomic resolution. Based on the STM theory of Tersoff and Hamann the process of data acquisition can be approximated by the convolution of a localised atomic density of states (i.e. narrow spots in the reconstruction) of the sample and a Gaussian resolution function which limits the resolution. In STM practice a good and robust estimation of the atomic core positions is necessary for different reasons, such as to be able to calculate the characteristics of the atomic lattice or to study non-periodicities.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s0021653530439
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  • 10
    Electronic Resource
    Electronic Resource
    Data management in multi-method surface analysis (1995)
    Springer
    Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 443-446 
    Details
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract The solution of the problem of interchangeability of surface analytical data is gaining increasing importance in multi-method surface analysis. There are various surface analytical instruments in different laboratories on several automation levels. For these instruments, which are controlled by computer systems working with proprietary software under various operating systems, a standardised data format is necessary to allow an exchange of data. Therefore, a toolkit has been developed for the transfer, archiving and editing of surface analytical data in a standardised public domain format. This format contains all available and necessary information on experimental conditions and all parameters specific for a number of analytical techniques such as AES, SAM, XPS, SIMS, STM, AFM and EPMA. Additionally, all data concerning the conditions of sample-preparation and measurement history are included in order to allow a well-founded evaluation of the data and improved reproducibility of the experiment.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s0021653530443
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