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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1749-1752 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A compact 5-cm-diam multipolar electron cyclotron resonance (ECR) ion source is characterized. The source is experimentally studied with no grids using argon gas with 50–250 W of 2.45-GHz microwave input power. Using a microcoaxial probe it was confirmed that the exciting electromagnetic fields within the resonant cavity were indeed TE111, as expected from the critical cavity dimensions. Double Langmuir probe measurements indicate high densities of about (4–5)×1011/cm3 near the source, and 5 cm downstream from the source output the densities become very uniform with a value of about 5×1010/cm3 over a 10-cm diameter. Electron energy distribution functions (EEDF) were measured using a single Langmuir probe. Average electron energies were seen to be about 8–10 eV with an energy distribution function falling between a Maxwellian and a Druyvesteyn distribution. Ion energy distribution functions (IEDF) were measured with a multigrid energy analyzer. It was seen that the distribution functions were narrow and peaked [with a full width half maximum (FWHM) of about 5 eV] except under certain conditions. Above 200-W input power, and also below about 0.5 mTorr there is significant broadening of the ion distribution function. It is speculated that the former may be caused by gas heating, and the latter may be caused by the presence of Ar+2 ions. With its high current densities ((approximately-greater-than)10 mA/cm2) and low average ion energies (〈40 eV), it is expected that this ion/plasma source will be very useful in many etching and deposition applications.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1310-1310 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A compact 5-cm-diam multipolar electron cyclotron resonance (ECR) ion source is characterized. The source is experimentally studied with no grids using argon gas with 50–250 W of 2.45-GHz microwave input power. Using a microcoaxial probe it was confirmed that the exciting electromagnetic fields within the resonant cavity were indeed TE111, as expected from the critical cavity dimensions. Double Langmuir probe measurements indicate high densities of about (4–5)×1011/cm3 near the source, and 5 cm downstream from the source output the densities become very uniform with a value of about 5×1010/cm3 over a 10-cm diameter. Electron energy distribution functions (EEDFs) were measured using a single Langmuir probe. Average electron energies were seen to be about 8–10 eV with an energy distribution function falling between a Maxwellian and a Druyvesteyn distribution. Ion energy distribution functions (IEDF) were measured with a multigrid energy analyzer. It was seen that the distribution functions were narrow and peaked [with a full width half maximum (FWHM) of about 5 eV] except under certain conditions. Above 200-W input power, and also below about 0.5 mTorr there is significant broadening of the ion distribution function. It is speculated that the former may be caused by gas heating, and the latter may be caused by the presence of Ar+2 ions. With its high current densities ((approximately-greater-than)10 mA/cm2) and low average ion energies (〈40 eV), it is expected that this ion/plasma source will be very useful in many etching and deposition applications.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 250-252 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The technology for producing uniform, high density (1011–1012/cm3) microwave discharges over cross sections of 50 cm2 is well established. The present challenge is to extend the high density, and electrodeless benefits of microwave discharges to produce uniform densities over an area of 300–700 cm2. Such discharges have important applications for 6 to 8-in. single wafer processing and as large surface, broad beam, high current density ion sources. The design principles for scaling the 18 cm diam MPDR ECR cavity applicator technology to 38–47 cm diam are reviewed. Microwave discharges with diameters of 20–30 cm can be created when these applicators are excited with either 2.45 GHz or 915 MHz. The design and construction of a prototype cavity applicator with a 20 cm diam discharge is described. The discharge is enclosed with a 12-pole multicusp static magnetic field produced by 2-in. by 2-in. by 1-in. rare-earth magnets. Each magnet has a pole face field strength of 3 kG. The experimental test of this plasma source in argon gas excited with 2.45 GHz energy is reviewed.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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