Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
74 (1999), S. 585-587
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The reverse gate bias current–voltage characteristics of n+ polycrystalline-Si/SiO2/p-Si tunnel structures containing nanoscale quantum wires embedded in ultrathin oxide layers are analyzed using a three-dimensional quantum mechanical scattering calculation. By varying wire geometry, our model can qualitatively reproduce experimental current–voltage characteristics for ultrathin oxides having undergone soft breakdown or breakdown. We find that low-bias current densities can be greatly enhanced by resonant tunneling, and that this mechanism is highly temperature dependent. We demonstrate that funneling of wave functions into quantum wires results in highly efficient localized conduction paths which contributes to dramatic current increases in the direct tunneling regime. We also explain how quantum wires which extend partially into the oxide layer from the SiO2/p-Si interface can be used to model soft breakdown current–voltage characteristics. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.123153
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