ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Depth profiles of fluorine in 19F+-implanted tin-oxide films have been accurately measured using 19F(p,αγ)16O resonance nuclear reactions at ER=872.1 keV and ER=340.46 keV. A proper deconvolution calculation method was used to extract the true range distribution of implanted fluorine from the experimental excitation yield curves. The range distribution parameters, RP and ΔRp, were thereby obtained and were compared with those obtained by Monte Carlo simulations. The experimental Rp values agree with the Monte Carlo simulation values very well, while the experimental ΔRp values are larger than those obtained theoretically. This phenomenon may be attributed to the enhanced diffusion during the ion implantation.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.352806
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