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  • 1
    ISSN: 1432-0428
    Keywords: Human proinsulin ; radioimmunoassay ; standards
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Notes: Summary Two new batches of pancreatic human proinsulin have been compared with biosynthetic human proinsulin. Standards of these three proinsulin preparations were made on the basis of quantitative amino-acid analyses and compared in two proinsulin radioimmunoassays with a proinsulin standard prepared 14 years ago. The curves of the new standards were superimposable. However, they differed considerably from the curve of the old standard which proved to be only one-third of the strength of the new standards, thereby leading to a threefold over-estimation of proinsulin concentrations when the old standard is used. We conclude that the new standards should replace previously used standards.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 2420-2422 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: InAs1−xBix with x≤0.026 and InAs1−x−ySbyBix with x≤0.017 and y≤0.096 have been successfully grown on InAs (100) oriented substrates by atmospheric pressure organometallic vapor phase epitaxy using the precursors trimethylindium, trimethylbismuth, trimethylantimony, and arsine. Good surface morphologies for both InAsBi and InAsSbBi epitaxial layers were obtained at a growth temperature of 400 °C. A key growth parameter is the V/III ratio. Only a very narrow range near 4 (considering the incomplete pyrolysis of AsH3) yields smooth InAsBi epilayers. Typical growth rates were 0.02 μm/min. X-ray diffractometer scans show clearly resolved Kα1 and Kα2 peaks for the layer of InAs0.889Sb0.096Bi0.015 grown on an InAs substrate with a graded transition layer to accommodate the lattice parameter difference. The half widths of the peaks are comparable to those of the substrate. For the first time, photoluminescence (PL) at 10 K from these Bi-containing alloys has been measured. The PL peak energy is seen to decrease with increasing Bi concentration at a rate of 55 meV/at. % Bi. InAsSbBi is a potential material for infrared detectors operating in the wavelength range from 8 to 12 μm.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Journal of neurochemistry 46 (1986), S. 0 
    ISSN: 1471-4159
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Medicine
    Notes: Abstract: The effects of preincubating cerebral cortical membranes with phospholipase A2 (PLA2) were examined on radioligand binding to benzodiazepine receptors of the “central” and “peripheral” types. PLA2 (0.005–0.1 U/ml) increased [3H]flunitrazepam and [3H]3-carbo-ethoxy-β-carboline binding by increasing the apparent affinities of these ligands with no concomitant change in the maximum number of binding sites. In contrast, neither γ-aminobutyric acid (GABA)-enhanced [3H]fluni-trazepam binding nor [3H]Ro 15–1788 binding was altered by preincubation with PLA2 at concentrations as high as 2 U/ml. Both pyrazolopyridine (SQ 65,396)- and barbiturate (pentobarbital)-enhanced [3H]flunitrazepam binding and [35S]t-butylbicyclophosphorothionate (TBPS) binding were markedly reduced by as little as 0.0025–0.005 U/ml of PLA2. These findings suggest that PLA2 inactivates the TBPS binding site on the benzodiazepine-GABA receptor chloride ionophore complex, which results in a selective loss of allosteric “regulation” between the components of this complex. PLA2 also reduced the apparent affinity of [3H]Ro 5–4864 to peripheral-type benzodiazepine receptors in cerebral cortical, heart, and kidney membranes, but increased the number of [3H]PK 11195 binding sites with no change in apparent affinity. These data demonstrate that PLA2 can differentially affect the lipid microenvironment of “central” and “peripheral” types of benzodiazepine receptors.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 803-805 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Interdiffusion can be either increased or decreased when annealing epitaxial layers covered by an oxide of GaAs. AlGaAs/GaAs quantum wells (QWs) of different widths were grown by organometallic vapor phase epitaxy. A top layer of GaAs was thermally oxidized at 450 °C, and rapid thermal annealing (RTA) was performed at 950 °C under Ar. Photoluminescence showed that an order of magnitude increase in interdiffusion occurred in the oxide-covered QWs compared to uncovered QWs. However, when a thin layer of Al was evaporated over the oxide layer prior to RTA, the rate of interdiffusion was reduced by more than order of magnitude compared to that of uncovered QWs. Interdiffusion slows because the oxide, composed primarily of Ga2O3, is quickly reduced by Al metal during RTA to form atomic Ga and Al2O3. The Al2O3 layer formed over the QWs traps the free Ga as interstitials in the GaAs. The excess Ga interstitial concentration reduces the group III vacancy concentration, and it is this reduction in group III vacancy concentration which slows the interdiffusion rate. The results show that metallurgical reactions may be used as a tool for engineering native defect concentrations and associated diffusivities. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 1902-1906 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The zinc concentration measured after organometallic vapor phase epitaxy (OMVPE) growth on (100)-oriented GaAs at 700 °C has been compared to the zinc concentration measured after in-diffusion under near-equilibrium conditions. During diffusion, the concentration of Zn 20 nm below the surface was found to vary with P1/2Zn, as expected for bulk solid–vapor equilibrium. During growth, the concentration of Zn varied linearly with PZn up to a maximum value which was found to correspond to the solubility limit set by second phase formation, e.g., growth of Zn3As2. Although large differences were observed between the results of the two experiments when using nominally identical ambient conditions, all of the results are consistent with a thermodynamic model in which the Fermi level at the surface is pinned approximately 200 meV below the intrinsic Fermi level. Typical OMVPE growth conditions appear to give a bulk zinc concentration which is supersaturated relative to the ambient partial pressures used, and to enhance the diffusion of Zn into the substrate. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 2857-2863 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A major remaining challenge for III/V semiconductor materials is the development of materials for photonic devices operating in the infrared region of the spectrum. Atmospheric transmission windows exist in the wavelength ranges from 2 to 4.5 and from 8.5 to 12 μm. Thus, emitters and, particularly, detectors operating in these wavelength ranges are important for many applications. Materials for devices operating in the longer-wavelength 8–12 μm region have typically not been III/V semiconductors because the lowest-band-gap conventional III/V alloy is InAsSb, with a 77 K band gap of 0.145 eV, corresponding to a wavelength of 8.5 μm. Previous work has shown that the addition of Bi to InAsSb alloys grown by organometallic vapor-phase epitaxy results in a rapid reduction in the band-gap energy. However, very low temperatures were required to obtained significant levels of Bi incorporation into the solid, due to the immiscibility of Bi in InAsSb. The low growth temperatures result in high carbon contamination levels using conventional precursors. Clearly, new precursors are required for low-temperature growth of these alloys without excessive levels of carbon contamination. New results for the organometallic vapor-phase-epitaxy growth of InAs1−x−ySbxBiy alloys are presented using the novel precursors tertiarybutylarsine, tertiarybutyldimethyl-antimony, and ethyldimethylindium. Alloys have been studied over the entire range of Sb/As ratios in the solid. For growth at 350 °C, the maximum Bi concentration yielding layers without the presence of a liquid second phase was found to be highest for x=0 (y=0.045) and lowest for x=0.7 (y=0.015). These levels of Bi incorporation yield calculated 77 K band gaps of 0.08 eV for the alloy with x=0.5 and y=0.015. These layers have several orders of magnitude lower levels of carbon contamination than reported previously.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 4903-4915 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Interdiffusion experiments and results for InP-GaInAs(P) heterostructures are reviewed and discussed within a thermodynamic model. Important factors affecting interdiffusion in the GaInAsP system are shown to include the (1) miscibility gap, (2) different diffusivities on each sublattice in each material, (3) Fermi level or impurity induced changes in diffusivity and perhaps diffusion mechanism, and (4) experimental technique chosen. With a miscibility gap present, the activity coefficients and solubilities of all species vary near a heterojunction and cause the interdiffusion to become strongly composition dependent. At commonly used growth and annealing temperatures, many superlattices are expected to equilibrate as two quaternary superlattices rather than a homogeneous alloy. Different diffusivities on each sublattice in a superlattice can lead to either a widening or a narrowing of quantum wells. When this occurs, optical measurements of the band gap energy are likely to be misleading because of quantum size effects. Diffusivity on each sublattice can be changed by the presence of group II, IV, or VI dopants. Diffusion on the group III sublattice in p-type GaInAsP is found to be consistent with an interstitialcy mechanism, but the mechanism remains unknown with n-type doping and for the group V sublattice. Diffusion experiments performed in closed, open, and capped environments are discussed. Poorly designed and controlled experiments are found to be associated with large discrepancies in observed diffusivities, unreliable concentration profiles, and new condensed phases appearing in the solid. Experiments to date indicate that the Cu-Pt ordered structure often found in GaIn(As)P epilayers are unstable, and not strain stabilized, relative to the disordered structure at commonly used growth and annealing temperatures.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 1187-1191 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Infrared photoluminescence (PL) from InAsBi and InAsSbBi epitaxial layers grown by atmospheric pressure organometallic vapor phase epitaxy has been studied. The PL from ternary InAsBi was investigated for Bi concentrations of ≤2.3 at. %. The peak energy decreases at a rate of 55 meV/at. % Bi with increasing Bi concentration. A study of the transmission spectra of these Bi-containing alloys confirms the above result. The PL peak is assigned to near band edge emission for InAsBi. The value of dEg/dx=−55-meV/at. % Bi is more than double the previously reported theoretical prediction for the band gap of InAsBi. The PL for the quaternary layer of InAsSbBi is also studied for Sb concentrations of 〈10 at. % and Bi concentrations of ≤1.5 at. %. Bi incorporation in InAs1−xSbx(0.07〈x〈0.10) reduces the PL peak energy at a rate of 46-meV/at. % Bi. These results imply that incorporation of only a few percent of Bi is required in InAs0.35Sb0.65 to achieve a band gap of 0.1 eV, equivalent to a wavelength of 12 μm, desired for infrared detector applications.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 3940-3942 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: InAs and InAsBi have been grown by atmospheric pressure organometallic vapor phase epitaxy (OMVPE) over a broad temperature range from 600 to as low as 275 °C. This is the lowest growth temperature ever reported for standard OMVPE. It is demonstrated that lowering the growth temperature is the most effective approach for increasing the Bi content in InAsBi alloys. For example, InAsBi samples with Bi concentrations as high as 6.1 at.% have been successfully grown at a temperature of 275 °C. Trimethylindium, arsine, and trimethylbismuth were used as precursors for most experiments. The growth efficiency is a constant for temperatures above 400 °C, indicating the growth rate is diffusion limited in this temperature regime. For lower temperatures, it decreases exponentially with decreasing temperature with an activation energy of 24 kcal/mol. Incomplete pyrolysis of TMIn limits the growth rate in this temperature regime. However, by substituting ethyldimethylindium for TMIn the diffusion controlled regime can be extended to lower temperatures. Hall effect measurements show that the n-type background concentration increases from approximately 2.3×1016 to 1019 cm−3 as the growth temperature decreases from 600 to 325 °C. Secondary-ion mass spectroscopy results show that the dominant impurity is carbon. Thus, carbon is mainly a donor in these materials.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 612-618 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A type-I semiconductor quantum well inherently consists of two quantum wells, one each in the conduction and valence bands. A new method to decouple and independently analyze these two wells is presented. The interband 3e-3h and 1e-1h transitions are decoupled by using the commonly observed 1e-3h transition. The resulting intraband 3h-1h and 3e-1e transitions are used to independently estimate the band offset and carrier mass in each well. Decoupling of the wells in each band adds a degree of freedom to the problem and allows an independent calculation of the average well width to be made. In addition, an accurate linear approximation is developed for use in place of the usual trigonometric solution to the quantum-well problem. For Al0.30Ga0.70As/GaAs quantum wells, results are found to be highly consistent with Qc =0.605, and m@B|hh =0.321 and m*e =0.0671 in the well.
    Type of Medium: Electronic Resource
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