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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 3328-3331 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The use of a piezoelectric crystal as the substrate for a photoresist film provides unique resist characterization capabilities. In particular, the photoresist near the substrate is probed in real time. The basis of this measurement technique is described, emphasizing the physical phenomena responsible for observed piezoelectric crystal response behavior. Demonstration of this analysis to a gelatin-based resist is given. The influence of solvent drying is readily distinguishable from the effects of photohardening reactions.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 2627-2629 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The particle velocity distribution on an AT-cut quartz crystal oscillating in water is used to model the liquid flow profile near the crystal surface. The nonuniform particle velocity on the quartz surface results in vertical motion in the bulk liquid. This causes a pressure wave to be launched from the quartz surface. This wave is used to measure the velocity of sound in the liquid.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Journal of applied electrochemistry 16 (1986), S. 189-195 
    ISSN: 1572-8838
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Electrical Engineering, Measurement and Control Technology
    Notes: Abstract Despite growing interest in pulse current electroplating, published theories have not evolved beyond treatments of simple, single-step reaction kinetics. This omission of multiple-step kinetics and associated reaction pseudocapacitance is responsible for the inability to interpret mechanistically several key pulse current electrodeposition process characteristics. A complex kinetics charge transfer model is developed to describe the enhanced geometric control of deposit thickness achievable with judiciously chosen pulse current control conditions. This semiquantitative analysis demonstrates that deposit thickness ‘levelling’ is primarily the result of the strong potential dependence of the reaction pseudocapacitance, together with proper choices of pulse current control variables. For any system of interest, a well defined on-time current,I A, and on-time and off-time periods,t A andt B, are optimum for minimizing relative deposit thickness variation.
    Type of Medium: Electronic Resource
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