ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Polystyrene-polymethylmethacrylate (PS-PMMA) block copolymers are well known toexhibit microphase separation to form a series of regular structures with local periodic arrangementsof the blocks. By developing films of PS-PMMA within topographically patterned silicon (100)substrates (with photolithographically defined rectangular channels of depth 60 nm and widths 166– 433 nm) these irregular arrangements form highly periodic structures where the features areparallel to the side walls of the channels. However, the use of silicon substrates leads to problems inprocessing of these films. PS-PMMA does not wet the surface, and this results in island formationon flat substrates. On channel etched substrates this phenomena ensures that the thickness of thefilms is irregular and poorly defined alignment is seen. Detailed considerations of this polymersystem suggest that feature sizes below 25 nm are not realisable. The results suggest othercopolymer systems should be studied
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/16/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.555.29.pdf
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