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  • 1
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Solid state phenomena Vol. 99-100 (July 2004), p. 65-72 
    ISSN: 1662-9779
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Physics
    Notes: Two types of silver-doped glass were used for direct laser recording of 2D and 3Dphotonic crystals. The first contained a diffusion layer (20 microns thick) with embedded silver nanoclusters of 20-nm average radius. 2D and 3D photonic crystals of submicron lattice parameters were fabricated by nanosecond pulsed laser irradiation (l, = 355 nm) using four or five coherent intersecting beams. Under irradiation the clusters absorbing light energy are heated to high temperatures and become mobile due to the formation of liquid shells around them. Adjacent clusters move towards each other and towards the irradiated surface under local temperature gradients, form agglomerates and merge in periodically located "spots" of high light intensity in the interference field. The second type of glass, photosensitive to UV irradiation, contained in the bulk Ag+ and Ce3+ ions. Under UV irradiation excited electrons passed from Ce3+ to Ag+. The Ag atomsbecame neutral and under subsequent heat treatment of the glass at elevated temperatures have a tendency to form nanoclusters, thus “developing” the UV recorded patterns. Using nanosecond pulsed irradiation of 308 nm we have recorded 3D photonic crystals in the bulk of such glass
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Solid state phenomena Vol. 94 (June 2003), p. 105-114 
    ISSN: 1662-9779
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 54 (1992), S. 363-368 
    ISSN: 1432-0630
    Keywords: 42.60 ; 42.70 ; 81.40
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Ablation of fused silica using standard excimer lasers (20–30 ns pulse duration at 193, 248, and 308 nm) and a short pulse laser system (500 fs at 248 nm) is reported. Ablation rates range from several hundred nm/pulse (193 nm or fs-laser) up to about 6 μm/pulse (308 nm). The performance of the ablation is found to depend not only on wavelength and pulse duration but also on the existing or laser induced surface quality (e.g., roughness) of the material. Special ablation phenomena are observed. At 193 nm and moderate fluence (3 J/cm2) ablation takes place at the rear side of a plate without affecting the front side, whereas at higher fluence normal ablation at the front side occurs. At 248 nm (standard excimer) the existence of two consecutive ablation phases is observed: smooth ablation at low rate is followed by explosive ablation at high rate. Using fs-pulses smooth shaped holes are formed during the first pulses, whereas high pulse numbers cause the development of a ripple structure in the ablation craters. The results lead to the conclusion that two different ablation mechanisms are involved: the first is based on two photon bulk absorption, the second on controlled surface damage in relation with (partially laser induced) singularity conditions at the surface.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 63 (1996), S. 505-508 
    ISSN: 1432-0630
    Keywords: 42.60 ; 81.40Z ; 81.60Z
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Ablation of submicron structures on copper and silicon by short ultraviolet laser pulses (0.5–50 ps, 248 nm) is presented. Features like periodic line structures with a line-spacing below 400 nm, and holes with characteristic sizes well below 1 µm are produced on the sample surface by single laser shot exposure. The structures are projection printed by a Schwarzschild-objective (N.A.=0.4) in air environment. The morphology of ablation sites made with different pulse durations (0.5 ps, 5 ps, 50 ps) is discussed in terms of thermal diffusion effects.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 65 (1997), S. 517-518 
    ISSN: 1432-0630
    Keywords: PACS: 42.80; 81.40Z; 81.60Z
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: 3 by short ultraviolet laser pulses (0.5 ps, 248 nm) is presented. Gratings with a period of 360 nm and a modulation depth of 80 nm are fabricated on the sample surface by single-laser-shot exposure. The structures are projection imaged by a Schwarzschild objective in air. The modulation depth can be varied by applying multiple-pulse exposure.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1432-0630
    Keywords: PACS: 79.20 Ds; 81.65 Cf; 82.50 Fv
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1432-0630
    Keywords: PACS: 42.40; 42.80; 81.60Z
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. Masks for laser processing are generated by laser ablation patterning of dielectric layer systems. The application of these masks for the rapid fabrication of diffractive optical elements (DOEs) is presented. The diffractive optical elements are designed as phase-only elements, assuming an illumination with a plane wave. A continuous phase function is calculated using an iterative Fourier transform algorithm (IFTA). This continuous phase function is reduced to two or four levels by an iterative Fourier quantisation algorithm (IFQA) that is able to include focal power. The fabrication of the DOE is performed in a two-step process. First, a binary amplitude mask (or a set of masks for multi-level DOEs) is made by structured ablation of a highly reflective dielectric coating (HR 248 nm) from a fused silica substrate. This is accomplished by using an ArF excimer laser emitting at 193 nm, a wavelength that is sufficiently absorbed in the HfO2/SiO2-dielectric layer system, leading to precisely ablated mask structures. In the second step, this mask is used in a 4:1 projection configuration to generate a surface profile in a polymer substrate by ablation at 248 nm. The depth modulation can be defined by adjusting laser fluence and pulse number. Examples of DOEs ablated in polycarbonate are shown and their performance is characterised.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 97 (1993), S. 12296-12301 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 59 (1988), S. 2502-2503 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Wavelength-dependent time lags due to group velocity dispersion (GVD)—much larger than estimated and documented thus far—have been determined experimentally for some widely used streak camera objectives. Correction procedures for signals delayed and broadened by group dispersion in streak camera objectives are briefly outlined.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 2847-2855 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The influence of excimer laser irradiation (193 nm, 20 ns pulses and 248 nm, 20 ns and 500 fs pulses) on the structure and morphology of plain and gold-film coated mica surfaces has been investigated for fluences between 8 mJ/c2 and 19 J/cm2. Surfaces treated with laser fluences below the ablation threshold (λ=248 nm) are well suited for controlled growth of metallic films, whereas above-threshold treated samples (λ=193 nm) form roughened surfaces with close-packed arrays of cones. The cone generation can be suppressed by appropriate choice of laser parameters, resulting in the formation of ablation holes with micrometer precision. The same precision can be obtained in ultrathin metallic films without destroying the underlying mica surface. Low-energy electron diffraction is used to monitor laser-induced microscopic changes of the mica surface upon low-fluence irradiation. It is seen that the first step of the ablation process includes reorientation of dipole domains on the surface. Thereafter, scanning electron microscopy reveals melting of the surface and the onset of explosive sputtering processes. Studies of the ablated products by the use of quadrupole mass spectrometry, quartz microbalance, and photoimaging indicate large kinetic energies and a high directionality of the ablated products. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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