Electronic Resource
s.l. ; Stafa-Zurich, Switzerland
Advances in science and technology
Vol. 54 (Sept. 2008), p. 223-226
ISSN:
1662-0356
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Natural Sciences in General
,
Technology
Notes:
Highly transparent silicon carbon nitride (SiCN) films were prepared by hot wire chemicalvapor deposition (HWCVD) at low temperature as low as 40oC. Hexamethyldisilazane (HMDS) andNH3 were used as the source materials for SiCN deposition. The SiCN film prepared by only HMDSwas completely transparent in the wavelength of the visible region. Moreover, there was a littleabsorption in the ultraviolet region. However, SiCN prepared by using HMDS and NH3 showedalmost transparent both visible and UV regions
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/42/transtech_doi~10.4028%252Fwww.scientific.net%252FAST.54.223.pdf
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