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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 17 (1995), S. 1759-1762 
    ISSN: 0392-6737
    Keywords: Optical transient phenomena (including quantum beats, dephasings and revivals, photon echoes, free induction decay, and optical mutation) ; Excitons and related phenomena (including electron-hole drops) ; Time-resolved optical spectroscopies and other ultrafast optical measurements in condensed matter ; Optical properties of thin films, surfaces and thin layer structures (including superlattices, heterostructures, and intercalation compounds) ; Conference proceedings
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Summary We study exciton ionization induced by an axial electric field in a strongly coupled GaAs/Al0.3 Ga0.7 As superlattice at low temperatures. The field-induced ionization times of the heavy-hole 1s exciton in the miniband field regime are determined from transient four-wave-mixing experiments and theoretical model calculations. They are found to lie between the field ionization times of excitons in bulk semiconductors, and in strongly confined quantum well systems.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 1693-1695 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Nonalloyed tungsten ohmic contacts to the Inx Ga1−x As/GaAs/Aly Ga1−y As (x=0.4, y=0.25) graded-gap heterostructure showed excellent surface morphology after annealing of up to 1000 °C for 10 s. The minimum value for the specific contact resistance (1.3×10−6 Ω cm2 ) was obtained following annealing at 600 °C for 10 s. The increase in contact resistivity at higher temperatures was related to the increase in the heterostructure sheet resistance due to layer intermixing and In and Ga outdiffusion. The W/InGaAs graded-gap refractory ohmic contact can be used as a self-aligned emitter in heterojunction bipolar transistors.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 2592-2594 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The study of diffusion and drift of Si in AlxGa1−xAs by means of capacitance-voltage measurements reveals that low substrate temperatures during growth by molecular beam epitaxy are required to achieve δ-function-like doping profiles. The diffusion coefficient of Si in Al0.3Ga0.7As is determined. We further show theoretically that the random Poisson distribution (usually assumed for dopant distributions in semiconductors) should be modified at high dopant concentrations due to repulsive interactions of impurities.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 340-342 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report room-temperature observation of Wannier–Stark localization in a GaAs/AlGaAs superlattice. We show that large modulation can be obtained over a wide spectral range and demonstrate the operation of a self-electro-optic effect device.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6139-6145 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of the ambient conditions in the growth chamber of the molecular beam epitaxy machine during the growth of GaAs/Al0.35Ga0.65As structures was investigated. Both growth-interrupted (120 s at each heterointerface) and uninterrupted surfaces and interfaces were evaluated using a growth temperature of 580 °C. Two ambient conditions were studied: (a) ∼1×10−10 Torr O2; and (b) ultrahigh vacuum (UHV, ∼5×10−11 Torr, with no intentional introduction of contaminants). A striking difference was observed in both the 1.7 K photoluminescence (PL) spectra of single quantum well (SQW) structures and UHV scanning tunneling microscopy (STM) of surfaces, which were grown under ambient condition (a) as opposed to (b). When consecutive growth-interrupted SQW samples were grown with different well widths (25 and 28 A(ring)) under condition (a), the emission energy splitting into several peaks was observed, indicating discrete thicknesses of the well. However, the peak energies shifted as the laser spot was scanned across each sample. Additionally, the peak energy shifted from sample to sample for the same nominal well width.On the other hand, when SQW samples were grown under condition (b), no variation in the emission energy was observed as the laser was scanned across the sample, or from sample to sample for a given well width. Furthermore, the PL observations are supported by UHV-STM results. UHV-STM images indicated a very rough surface with large islands containing small terraces on top (a bimodal distribution) for condition (a). Conversely, when samples were grown under condition (b), only large islands were observed. For growth interrupted GaAs surfaces, 400 A(ring)×600 A(ring) islands were observed, and for Al0.35Ga0.65As, they were 150 A(ring)×400 A(ring), with a one-monolayer step in between islands. These data are consistent with abrupt interfaces with only a single-mode distribution for growth-interrupted surfaces. On the other hand, UHV-STM images of uninterrupted GaAs surfaces grown under condition (b) showed islands that were 40–60 A(ring) across. Photoluminesce spectra of a similarly grown SQW sample showed only a single broad emission line, consistent with an interface configuration of many steps which are smaller than the exciton diameter. The results show that interface roughness is sensitive to background O2.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The implant isolation characteristics of highly doped n- and p-type GaAs epitaxial layers implanted with 5 MeV O+ ions are reported. High (∼108 Ω/(D'Alembertian)) sheet resistances are obtained in such layers following annealing at 550–600 °C for ion doses around 1015 cm−2. The residual conductivity is still due to hopping processes with small activation (50–70 meV) energies. The use of a single MeV O+ implant considerably simplifies the isolation of GaAs/AlGaAs heterojunction bipolar transistor (HBT) structures relative to the usual multiple-implant keV energy scheme. Small geometry (2×5 μm2) HBTs with gains of 25 for highly-doped (p=7×1019 cm−3) base layer structures have been fabricated using MeV implant isolation.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 5004-5011 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The band offset parameter Qc = ΔEc/ΔEg for both GaAs/AlGaAs (lattice matched to GaAs), and GaInAs/AlInAs (lattice matched to InP) was extracted from the optical interband transition energies obtained from both triangular and parabolic quantum well shapes of various widths. The wells were grown using continuous analog compositional grading as opposed to the discrete, superlattice (digital) grading used by previous researchers. Electron beam electroreflectance (EBER) was the primary technique used to measure the interband transition energies. By combining the theoretical energies from quantum mechanical potential well calculations with EBER measured energies, it was possible to extract band offset values in a self-consistent manner. Qc values obtained were 0.658±0.009 and 0.650±0.001 for GaAs/AlGaAs and GaInAs/AlInAs, respectively. Measurements also revealed that Qc was both temperature and concentration independent within the range of composition studied.
    Type of Medium: Electronic Resource
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  • 8
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The simultaneous formation of buried external collector and extrinsic base regions in GaAs/AlGaAs heterojunction bipolar transistor (HBT) structures by co-implantation of Be+ together with O+ or H+ ions is described. Oxygen implants at doses of ≥ 1012 cm−2, or proton implants at doses ≥ 1014 cm−2, followed by annealing at 500–550 °C, create fully depleted collector regions, while similar anneals lead to significant Be activation and lowered base resistance. Higher annealing temperatures improve this Be activation but restore the initial doping level in the implanted collector region. For Be+ ion doses ≤ 5≤5× 1014 cm−2 there are no defects visible by transmission electron microscopy in the HBT structure for annealing temperatures below 800 °C.
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This paper compares Hall-effect measurements combined with rapid thermal annealing (RTA) and low-temperature photoluminescence (4-K PL) as characterization techniques for the optimization of the growth of pseudomorphic InGaAs channel modulation-doped field-effect-transistor structures. The Hall-effect measurements with the RTA were used to determine the optimized growth temperature. 4-K PL was used to determine the quality of the InGaAs quantum well and the In mole fraction.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 1969-1979 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Spatial localization of Be in δ-doped GaAs within few lattice constants (〈20 A(ring)) is achieved at low growth temperatures for concentrations N2DBe 〈1014 cm−2 as indicated by capacitance-voltage profiles and secondary ion mass spectroscopy. At elevated growth temperatures and at higher Be concentrations, significant spreading of the dopants occurs and is explained by (i) Fermi-level pinning-induced segregation, (ii) repulsive Coulomb interaction of dopants, and (iii) diffusion. The highest Be concentration achieved at low growth temperatures exceeds 2×1020 cm−3 and is limited by repulsive dopant interaction. It is shown that the repulsive Coulomb interaction results in a correlated, nonrandom dopant distribution. The diffusion coefficient of Be in GaAs is determined and is found to be much lower than previously reported.
    Type of Medium: Electronic Resource
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