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  • 1
    Electronic Resource
    Electronic Resource
    Radiolysis of resist polymers. 2. Poly(haloalkylmethacrylates) and copolymers with methyl methacrylate (1984)
    s.l. : American Chemical Society
    Macromolecules 17 (1984), S. 2756-2761 
    Details
    ISSN: 1520-5835
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1021/ma00142a055
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  • 2
    Electronic Resource
    Electronic Resource
    Photoinduced localized atomic reaction (LAR) of 1,2- and 1,4-dichlorobenzene with Si(111) 7×7 (2000)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 112 (2000), S. 11005-11010 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: We report a comparative study of the photoinduced localized atomic reaction, LAR, of 1,2- and 1,4-dichlorobenzene (1,2- and 1,4-diClPh) on Si(111) 7×7, studied by scanning tunneling microscopy (STM). We observe different chlorine nearest-neighbor separations for the Cl–Si photoformed chemical "imprints" for the two adsorbates; the most probable separation of neighboring Cl's in the case of 1,2-dichlorobenzene being 8±3 Å, whereas that for 1,4-dichlorobenzene is 14±3 Å. These differing separations can be understood if the two C–Cl bonds in the respective adsorbates extend roughly linearly to chlorinate a nearby Si dangling-bond; for 1,2 diClPh the two C–Cl bonds are at 60° to one another leading to the chlorination of closely neighboring Si, whereas for 1,4 diClPh the two C–Cl bonds are at ∼180° leading to chlorination of sites twice as far apart, located to either side of the 1,4 diClPh adsorbate. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.481740
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  • 3
    Electronic Resource
    Electronic Resource
    Electron-induced "localized atomic reaction" (LAR): Chlorobenzene adsorbed on Si(111) 7×7 (1999)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 111 (1999), S. 9905-9907 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Electron-induced reaction of chlorobenzene (ClPh) adsorbed on silicon [Si(111)7×7] is shown by scanning tunneling microscopy (STM) to result in "localized atomic reaction" (LAR), imprinting Cl as chemically-bound Cl–Si on the surface. Voltage pulses of −4 V from the STM tip give LAR restricted to the site of electron impact. Delocalized electron impact imprints the self-assembled pattern of ClPh(ad) on the surface as Cl–Si. The imprint is found to be on the same area of the unit cell as ClPh(ad), but at adjacent atomic sites. The occurrence of LAR is ascribed to a concerted reaction; this can only occur if the new bond (Cl–Si) is directly adjacent to the old one (Cl–Ph). © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.480325
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  • 4
    Electronic Resource
    Electronic Resource
    Laser-enhanced gas surface reaction of chlorine with aluminum polycrystalline surface (1992)
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 96 (1992), S. 4496-4500 
    Details
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1021/j100190a068
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  • 5
    Electronic Resource
    Electronic Resource
    Photochemistry of dimethylcadmium on compound semiconductor surfaces (1997)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 106 (1997), S. 6552-6563 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: We present dynamical studies of the surface photochemistry of dimethylcadmium (DMCd) adsorbed on GaAs(110) and CdTe(110) surfaces. This important precursor for chemical vapor deposition is studied using time-of-flight (TOF) spectroscopy in conjunction with temperature programmed desorption (TPD). For the case of greater than one monolayer coverages, on these surfaces, both photofragmentation and photodesorption are observed following irradiation. The relative probabilities of these two processes are found to be strongly dependent on adsorbate coverage and incident photon energy. Direct photoabsorption by the adsorbed molecule is found to dominate the photofragmentation process, with the substrate strongly reducing the probability of photofragmentation at low coverages due to the operation of substrate mediated channels for excited state relaxation. The CH3 fragments observed following photodissociation are found to have kinetic energies that are invariant with the energy of the exciting photon (193 and 248 nm), an effect attributed to an efficient curve crossing between excited states in this molecule. The molecular desorption process is found to exhibit an unusual coverage dependence which is linked to the probability of deposition of a significant amount of vibrational excitation in the overlayer via substrate mediated de-excitation processes. Following the adsorption of one monolayer on the GaAs substrate, the photochemistry observed is significantly different due to the thermal dissociation of DMCd to form adsorbed methylgallium moieties. In this case, multiple features are observed in the TOF spectrum with kinetic energies significantly different to those observed for the gas phase or physisorbed molecule. Correlation of the TOF spectral features with thermal desorption data allows these TOF features to be assigned to specific adsorbed intermediates. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.473655
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  • 6
    Electronic Resource
    Electronic Resource
    Metabolic stereoisomeric inversion of ibuprofen in mammals
    Amsterdam : Elsevier
    Biochimica et Biophysica Acta (BBA)/Protein Structure and Molecular 1078 (1991), S. 411-417 
    Details
    ISSN: 0167-4838
    Keywords: 2-Arylpropionyl-CoA epimerase ; Ibuprofen isomerization ; Stereoselective drug metabolism
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Biology , Chemistry and Pharmacology , Medicine
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1016/0167-4838(91)90164-U
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  • 7
    Electronic Resource
    Electronic Resource
    The design of fully differential CMOS operational amplifiers without extra common-mode feedback circuits (1993)
    Springer
    Analog integrated circuits and signal processing 4 (1993), S. 173-186 
    Details
    ISSN: 1573-1979
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology
    Notes: Abstract A new fully differential CMOS operational amplifier (op amp) without extra common-mode feedback (CMFB) circuit is proposed and analyzed. In this op amp, simple inversely connected current-mirror pairs are used as active loads. From the theoretical analysis, it is shown that the common-mode signal can be efficiently suppressed by the reduced effective common-mode resistance of the active load. The proposed op amp with 2 pF capacitance loadings has an open-loop unity-gain bandwidth of 63 MHz, a phase margin 47°, and a dc gain of 67 dB in 3.5µm p-well CMOS technology. The common-mode gain at a single output node can be as low as —38 dB without extra CMFB circuit. Experimental results have successfully confirmed the capability of the efficient common-mode rejection.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01254868
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  • 8
    Electronic Resource
    Electronic Resource
    Radiolysis of resist polymers. VI. Copolymers of trihalophenylmethacrylate and methyl methacrylate (1985)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 23 (1985), S. 1421-1432 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Copolymers of several compositions of methyl methacrylate (MMA), trichlorophenyl methacrylate (TCPMA), and tribromophenyl methacrylate (TBPMA) have been synthesized and characterized. Gamma radiolysis yields are very sensitive to the presence of the halogenated monomers. With less than 10% of the halogenated monomer in the copolymers. Gs values were found to be much greater than that of PMMA. However, the halogenated monomer introduces a tendency toward crosslinking. The results are consistent with the enhancement of chain scission by dissociative electron capture and the tendency of phenyl radical intermediates to cause crosslinking. These structure-property relationships were found to be valid for all the homopolymers and copolymers investigated in this series.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1985.170230515
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  • 9
    Electronic Resource
    Electronic Resource
    Radiolysis of resist polymers. IV. Poly(p-substituted-α-methylstyrene)s (1984)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 22 (1984), S. 213-223 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: The effect of parasubstituents on the radiation chemistry of poly(α-methylstyrene) (PMS) was compared for the fluoro (PFMS), chloro (PCMS), bromo (PBMS), isopropyl (PiPMS), and methoxy (PMeOM) derivatives. Radiolysis yields, ESR spectra, and GC—MS analysis of products were obtained. PMS and PFMS have similar low radiolysis yields, products, and product distributions. Only main-chain radicals which persist to 200° were observed. PCMS has increased values of Gs, Gx, and Gr. The product analysis results suggest that the presence of chlorine contributes to the primary process by dissociative electron capture and enhances the cleavage of α-methyl group. Irradiation of PBMS caused crosslinking and yielded few volatile products. PMeOMS and PiPMS gel readily by γ-irradiation and may be useful as negative radiation resists.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1984.170220120
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  • 10
    Electronic Resource
    Electronic Resource
    Radiolysis of resist polymers. III. Copolymers of methyl-α-chloroacrylate and trihaloethylmethacrylates (1984)
    New York : Wiley-Blackwell
    Journal of Polymer Science: Polymer Chemistry Edition 22 (1984), S. 195-211 
    Details
    ISSN: 0360-6376
    Keywords: Physics ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Homopolymers of 2,2,2-trifluoroethyl(methacrylate) (TFEMA) and 2,2,2-trichloroethyl-(methacrylate) (TCEMA) and copolymers with methyl-α-chloroacrylate (MCA) in a range of compositions were synthesized. The reactivity ratios were obtained; the two copolymerizations were close to ideal. Poly(MCA) showed Gs = 7.4 and Gs = 0.9 by γ-radiolysis. On the other hand, poly(TFEMA) and poly(TCEMA) and Gs values of 2.0 and 2.4, respectively, and Gx = 0. Radiolysis of copolymers was initiated to a large degree by dissociative electron capture by the halogen atoms in both comonomers, as revealed by the ESR spectra of radicals derived from them. Germinal recombinations in irradiated poly(TFEMA) suggested the presence of radicals in proximity. This process was absent in the copolymers. GC-MS analysis of volatile products and other supporting evidence showed that TFEMA monomers tended to depolymerize; the TCEMA monomers did not. The radiolysis yields varied monotonically with the comonomer composition for the MCA-TFEMA system but the yield-composition relationship was irregular in MCA-TCEMA copolymers. Four noncrosslinking systems are potential radiation resists arranged in increasing order of promise: poly(TFEMA) (Gs = 2.0, Tg = 70°); poly(TCEMA) (Gs = 2.7, Tg = 142°); poly(94MCA-co-6TCEMA) (Gs = 2.7, Tg = 142°); and poly(68MCA-co-32TFEMA) (Gs = 3.0, Tg = 112°). These materials merit further investigation for E-beam or x-ray lithographic applications. Mechanisms of radiolysis for these materials, based on ESR, GC-MS, and radiolysis yield data, were discussed.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pol.1984.170220119
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