Electronic Resource
s.l. ; Stafa-Zurich, Switzerland
Solid state phenomena
Vol. 97-98 (Apr. 2004), p. 159-164
ISSN:
1662-9779
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Physics
Notes:
The behaviors of hydrogen in Al, Mg and MgAl thin films on stainless steel substrate were investigated in this work. The hydrogen ions extracted from plasma were used to load hydrogen into the film material. Glow discharge optical emission spectroscopy (GDOES) was applied to obtain the hydrogen depth profiles in Al films versus hydriding parameters. The MgH2, AlH3 and Mg(AlH4)2 hydrides were identified in plasma hydrided films using X-ray diffraction (XRD). It is shown that efficient supply transport of hydrogen from the surface into the bulk for Mg films takes place at temperature above 100 C and ion irradiation intensity above 1 mAcm-2
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/26/transtech_doi~10.4028%252Fwww.scientific.net%252FSSP.97-98.159.pdf
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