ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
We report on the development of a caesium ion sputter source for the production of small mass-selected atomic clusters. It has been designed to be compact and portable, enabling it to be attached to ultrahigh vacuum (UHV) systems for use in deposition experiments. The sputter source, developed from a high energy (∼20 keV) atomic ion beam source, has been modified by introducing a beam extraction section, resulting in a cluster beam energy of 1.5 kV. This allows mass selection to be performed with a compact Wien velocity filter, greatly reducing the dimensions of the source. The source produces sufficient intensities of small clusters (1 – 15 atoms/cluster) for UHV deposition experiments, for example, a deposition rate of 0.002 monolayers/min for Al7− focused onto a 1 cm2 area has been obtained. It is possible to produce beams of many materials, especially the noble metals and carbon. We show mass spectra for Agn −, Aln− , and Cn− clusters. © 1997 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1148293
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