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  • 1
    Electronic Resource
    Electronic Resource
    Surface photochemistry of divalent metal alkyls on SiO2 (1991)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 94 (1991), S. 1643-1652 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Metal-alkyl molecules adsorbed on chemically prepared silicon surfaces have been studied using infrared total-internal reflection and ultraviolet transmission spectroscopies, temperature-programmed desorption spectroscopy (TPD), and mass spectroscopy of laser induced desorption (LID) products. For chemisorbed species, the surface hydroxyl groups have been shown to be the prime adsorption sites. In addition, we determined the identity of the chemisorbed species and their fragments under ultraviolet photodissociation. Surface photodissociation was observed to be strongly wavelength dependent at 193 and 248 nm.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.459968
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  • 2
    Electronic Resource
    Electronic Resource
    IR diode laser study of vibrational energy distribution in CO2 produced by UV excimer laser photofragmentation of pyruvic acid (1987)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 87 (1987), S. 4598-4605 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Time domain absorption spectroscopy using a tunable, infrared diode laser has been used to monitor the vibrational excitation of CO2 produced in the 193 nm excimer laser photolysis of gas phase pyruvic acid (CH3COCOOH). Nascent vibrational populations were measured in the following ten vibrational states of CO2: 0000, 0110, 0220, 0330, 0440, 0001, 0002, 0003, 0111, and 0221. Approximately 97% of the CO2 photoproduct is observed to be directly formed in the vibrational ground state. The remaining molecules are formed with a significant degree of vibrational excitation, having mode temperatures T(ν2)=1800±150 K, T(ν3)=3700 ±1000 K, T(ν2+ν3)=2000±400 K. The present experimental data suggest that the 193 nm photolysis may proceed through more than a single dissociation channel and involve a number of different photofragments.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.453711
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  • 3
    Electronic Resource
    Electronic Resource
    Collisional excitation of CO2(0111) by hot hydrogen atoms: Alternating intensities in state-resolved vibrational, rotational, and translational energy transfer (1990)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 93 (1990), S. 445-451 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: Time domain tunable diode laser absorption spectroscopy has been used to measure rotationally resolved transient absorption line shapes and nascent rotational populations for CO2 molecules excited into the (0111) vibrational state by collisions with translationally hot hydrogen atoms. The even rotational levels are more heavily populated than the odd levels, in agreement with propensity rules derived earlier by Alexander and Clary. The nascent populations and transient linewidths are interpreted in terms of a theoretical model that lends insight into the H–CO2 collision dynamics. The cross section for exciting (0111) is ∼0.23 times the cross section for exciting (0001), and ∼0.38 times the cross section for exciting (1000).
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.459718
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  • 4
    Electronic Resource
    Electronic Resource
    Role of the chamber wall in low-pressure high-density etching plasmas (1995)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 497-504 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Ultraviolet-adsorption spectroscopy has been used to examine how the chamber wall affects the concentration of gas-phase reactants in high-density etching plasmas. This technique was employed to detect CF2 in an inductively coupled discharge used for the selective etching of silicon dioxide relative to silicon nitride and polycrystalline silicon (polysilicon) films. In plasmas containing C2F6 and CF4, the concentration of CF2 depends strongly on the applied power and operating pressure as well as the amount of polymer on the walls of the chamber. Changes in the conditioning of the chamber during the etch process cause significant variations in the concentration of CF2 in the discharge. The selectivity of etching SiO2 relative to Si3N4 films closely follows the concentration of CF2 under a variety of plasma operating conditions. The ability to measure a fundamental plasma characteristic that reflects the level of conditioning of the chamber is an important step in the real-time monitoring of a reactor parameter that currently can only be determined from postprocess measurements. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.359031
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  • 5
    Electronic Resource
    Electronic Resource
    Ultraviolet absorption spectroscopy for the detection of CF2 in high-density plasmas (1994)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 5967-5974 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Ultraviolet absorption spectroscopy has been employed to measure the density of CF2 in a high-density discharge used for the selective etching of silicon dioxide relative to silicon films. In a plasma containing C2F4H2 and CF4, CF2 accounts for more than 10% of the gas in the reactor. The level of CF2 in the discharge is strongly dependent on the operating pressure and the applied power. A comparison of the intensity of optical emission from CF*2 with the ultraviolet absorption signal and microwave interferometry measurements shows that the optical emission signal is limited more by the electron density than by the availability of ground state CF2. The UV absorption signal for CF2 closely follows the selectivity of etching SiO2 to silicon. Both neutral fluorocarbon fragments and ions are believed to play a role in the deposition of fluorocarbon films which give rise to this selectivity. The ability to measure a fundamental plasma parameter which closely correlates with etch selectivity is an important step toward the real-time determination of an etch characteristic which currently can only be determined from post-process measurements.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.358376
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  • 6
    Electronic Resource
    Electronic Resource
    Optical ion energy measurements in a radio-frequency-induction plasma source (1993)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 1621-1626 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In situ, Fabry–Perot interferometry was used to study the translational dynamics of ions in a magnetically confined, radio-frequency-induction (RFI) plasma reactor. Radial ion motion was characterized through measurements of the Doppler profile of emission from Ar+ ions. Radial ion energies depend on the operating power, pressure, and magnetic-field configuration. In a magnetically confined RFI plasma at 1000 W, ion energies increase from 0.08 to approximately 0.25 eV as the operating pressure is lowered from 13 to 0.18 mTorr. Complementary Langmuir probe studies of the plasma potential as well as its variation across the radius of the reactor illustrate the influence of electric fields on the radial motion of ions in the RFI system. These measurements illustrate that radially directed ion motion in the RFI reactor is significantly less than that reported previously for a divergent-field electron cyclotron resonance system.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.353195
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  • 7
    Electronic Resource
    Electronic Resource
    Rotationally resolved hot atom collisional excitation of CO2(0001) by time-resolved diode laser spectroscopy (1986)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 85 (1986), S. 4195-4197 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: A tunable infrared diode laser was used to study the nascent rotationa distribution of CO2 molecules produced directly in the 0001 excited state as a result of collisions with hot hydrogen atoms formed in the UV photolysis of H2S.(AIP)
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.450893
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  • 8
    Electronic Resource
    Electronic Resource
    Diode laser absorption probe of vibration-vibration energy transfer in carbon dioxide (1987)
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 91 (1987), S. 5540-5543 
    Details
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1021/j100306a008
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  • 9
    Electronic Resource
    Electronic Resource
    Invited commentary (1978)
    Springer
    World journal of surgery 2 (1978), S. 182-183 
    Details
    ISSN: 1432-2323
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01553546
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  • 10
    Electronic Resource
    Electronic Resource
    Invited commentary (1981)
    Springer
    World journal of surgery 5 (1981), S. 22-23 
    Details
    ISSN: 1432-2323
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01657828
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    Paper (German National Licenses)
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