Electronic Resource
New York, NY [u.a.]
:
Wiley-Blackwell
Advanced Materials for Optics and Electronics
4 (1994), S. 129-138
ISSN:
1057-9257
Keywords:
Silylation
;
Dry development
;
Photoresist
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Physics
Notes:
The issues of dry development and self-developing resists are addressed in this paper by way of an introduction to the main topic of surface imaging, in which diffusion-enhanced vapour plhase silylation chemistries and their mechanisms are developed with specific reference to resists that function through the DESIRE process. More recent liquid phase silylation processes are also considered.
Additional Material:
7 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/amo.860040207
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