ISSN:
1662-8985
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Chromium magnesium oxynitride ((Cr,Mg)(N,O)) thin films have been prepared bypulsed laser deposition (PLD) method with changing the surface area ratio of Mg target (SR) from 0to 100 %. As a result of the analysis by energy dispersive X-ray spectroscopy (EDX), it was foundthat magnesium content in the total metallic elements (Cr1-x, Mgx) are controlled by changing SRfrom 0 to 100 % to be the x ranging from 0 to 1.0. Since the crystal structure of main phase in allthin films was found to be NaCl type, the XRD results showed that the thin films were mainlyconsisted of (Cr,Mg)(N,O). The hardness of (Cr,Mg)(N,O) thin films were increased almost linearlyup to SR = 50 %, above which it decreases rapidly. The maximum Vickers hardness (HV) of 3600was obtained for the thin film which was prepared by SR = 50 %, and the minimum HV of 1650 wasobtained for the thin film which was prepared by SR = 100 %
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/39/transtech_doi~10.4028%252Fwww.scientific.net%252FAMR.11-12.311.pdf
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