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  • 1
    ISSN: 1432-0630
    Keywords: PACS: 78.70; 61.70; 61.80
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract.  We have measured positron lifetime and Two Dimensional Angular Correlation of Annihilation Radiation (2D-ACAR) distributions of Floating-Zone grown (FZ) Si specimens containing divacancies (V2) with the definite charge states, V0 2, V-1 2 or V-2 2 from room temperature to about 10 K. These charge states are accomplished by an appropriate combination of dopant species, their concentration and irradiation doses of 15 MeV electrons with reference to the currently accepted ionization level of divacancies. The positron lifetime of the negatively charged divacancy increases with temperature, while that of the neutral divacancy shows little change with temperature. The positron trapping rate, obtained from lifetime and 2D-ACAR measurements, increases markedly with decreasing temperature. This is found not only for the negative divacancies but also for the neutral divacancy. We need a model which explains this temperature dependence. The 2D-ACAR distribution from positrons trapped at divacancies shows nearly the same distribution for the different charge states, which differs considerably from the case of As vacancies in GaAs studied by Ambigapathy et al. We have observed a small but definite anisotropy in the distribution of trapped positrons in V- 2 using a specimen containing oriented divacancies.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Semiconductors 34 (2000), S. 998-1003 
    ISSN: 1063-7826
    Source: Springer Online Journal Archives 1860-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: Abstract The formation of small oxygen clusters upon heat treatment at 280–375°C was studied in crystalline silicon doped with hydrogen by high-temperature in-diffusion. The presence of hydrogen in concentrations of 1015–1016 cm−3 significantly enhances (by up to a factor of 106 at T≤300°C) the oxygen diffusivity in Si crystals. Possible mechanisms of interaction between O and H impurity atoms and the origin of hydrogen-enhanced oxygen diffusion in silicon are discussed.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Amsterdam : Elsevier
    Chemical Physics Letters 207 (1993), S. 132-136 
    ISSN: 0009-2614
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 1164-1168 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Excitation spectra have been measured at various temperatures for the intense luminescence lines at 1200 and 1320 nm which are observed in samples of Si-doped GaAs annealed at 900 and 500 °C, respectively. The excitation spectra of the 1200 nm line at 6 K has a sharp peak at 1.490 eV followed by a broad background component on the lower-energy side. This peak corresponds to the electronic excitation of donor (Si at Ga atom site) -acceptor (Si at As atom site) pairs in the crystal. The excitation spectra of the 1320 nm line at 6 K shows two peaks at 1.49 and 1.39 eV. The experimental results show clearly that the creation of donor-acceptor pairs in the above Si impurity complex is the major process of electronic excitation which leads to the intense luminescence at longer wavelengths such as 1200 and 1320 nm.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 7347-7350 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Far-infrared absorption has been investigated in n-type Czochralski-grown silicon saturated with hydrogen and then irradiated with fast electrons. Two series of absorption bands in the range 200–330 cm−1 are observed upon postirradiation annealing of the crystals at 300–550 °C. These bands are associated with ground–to–excited-state electronic transitions in two kinds of shallow donors with ionization energies of 37.0 and 42.6 meV, which are described well with the effective-mass approximation. These donors are related to defects observed earlier in electrical measurements. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 3035-3040 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of heat treatment of Si-doped GaAs was investigated with photoluminescence (PL) measurement. The dependence of PL spectra on the carrier concentration due to Si shows that the PL lines in the wavelength range between 950 and 1500 nm are classified into two types depending on whether the carrier concentration is lower or higher than approximately 7×1017 cm−3. There is also a similar behavior for PL spectra in the bound exciton wavelength region between 800 and 950 nm. The characteristic carrier concentration is about 6×1017 cm−3, and is related to the onset of overlap between wavefunctions of excitons bound to Si impurity.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 1618-1624 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of heat treatments on optical properties of Si-doped GaAs was investigated. Special care was taken to avoid the evaporation of As during heat treatment. Several kinds of photoluminescence peaks were found to be developed, depending on the Si concentration of the crystal and the temperature of the heat treatment. In crystals of high concentrations of Si a broad photoluminescence peak centered at about 1040 nm in wavelength was observed. The intensity and position of the peak were found to depend on the temperature of the heat treatment for a crystal in which the Si concentration was higher than 3.8×1018 atoms/cm3. The change in the peak position was accompanied by the changes in the optical absorptions related to SiGa-SiAs and SiAs-VGa pairs and also by the change in the concentration of free electrons. The characteristics of the observations were well interpreted with the idea that the photoluminescence peak was related to clusters of Si atoms and that clustering of Si atoms took place during heat treatment. Such clustering of Si atoms did not take place appreciably in a crystal of a Si concentration lower than 3.0×1018 atoms/cm3. The origins of other photoluminescence peaks related to shallow levels were identified, while those related to deep levels are not known at the present moment.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 4637-4637 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Experimental results related to investigations of the hydrogen (deuterium) molecule diffusivity in Si crystals are discussed. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 5831-5839 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Neutron-irradiation-induced defects in hydrogenated Si were investigated by detecting optical absorption due to their complexes with hydrogen. Specimens were doped with hydrogen by heating in H2 gas at 1300 °C followed by quenching in water. They were then irradiated with neutrons. The optical absorption spectra were measured at about 5 K with a Fourier transform infrared spectrometer. We investigated the dopant dependence and the annealing behaviors of H–interstitial (I) and H–vacancy (V) complexes. From the dopant dependence, we classified the peaks observed as I-related complexes or V-related complexes. In the annealing experiment, we observed numerous peaks after annealing above 300 °C in the region from 1940 to 2040 cm−1, whereas no such peaks were observed in the case of electron irradiation. This result shows that agglomerations of I and of V form more easily in neutron-irradiated Si than in electron-irradiated Si because of higher local concentrations of V and I in neutron-irradiated specimens. © 2002 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 81 (2002), S. 40-42 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Platinum–hydrogen (Pt–H) complexes in Si doped with Pt and H by heating at 1000–1300 °C followed by quenching in water were investigated from the measurements of optical absorption at 5 K and electron spin resonance (ESR) at 8 K. Optical absorption peaks at 1909.1 and 1910.3 cm−1 were observed in addition to the peaks due to the PtH and PtH2 complexes. The H doping temperature dependence of these peaks showed that the number of H atoms in the complex responsible for the 1909.1 cm−1 peak is larger than that for the 1910.3 cm−1 peak. We also observed ESR signals due to the PtH3 complex. The annealing behaviors of the 1910.3 cm−1 peak and the ESR signals were almost the same. Based on these results, the 1909.1 and 1910.3 cm−1 peaks are, respectively, assigned to the PtH4 complex and the PtH3 complex. © 2002 American Institute of Physics.
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