ISSN:
0268-2605
Keywords:
OMCVD
;
ceramic
;
thin films
;
metallacycle
;
titanium
;
Chemistry
;
Industrial Chemistry and Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
Notes:
The four-membered-ring heterocyclic molecule Cp2TiCH2Si(Me2)NSiMe3 (1; Cp=η-C5H5) was studied as a single-source precursor to titanium-based ceramic thin films. Its decomposition was studied at atmospheric and low pressure under nitrogen, argon and helium by TG-DTA-MS. Thin films containing the four elements of the metallacycle and oxygen were deposited on silicon substrates by low-pressure (20 Torr) chemical vapor deposition (CVD) between 773 and 923 K. Films were characterized by SEM-EDS, XPS, EPMA-WDS and XRD analyses. © 1997 by John Wiley & Sons, Ltd.
Additional Material:
9 Ill.
Type of Medium:
Electronic Resource
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