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  • 1
    Electronic Resource
    Electronic Resource
    A very compact electron cyclotron resonance ion source : Proceedings of the 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1097-1099 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A new electron cyclotron resonance (ECR) ion source has been developed in the laboratory. The ECR condition at 2.45 GHz is obtained in a multicusp arrangement using a set of four parallelepiped-shaped SmCo magnets regularly spaced around a cylindrical ionization chamber 50 mm in diameter and 50 mm in height. The electromagnetic cavity is made of a shielded quarter-wavelength Lecher line resonator coaxially coupled to the microwave generator through an excitation loop antenna and a SMA-type connector. The extracted argon ion beam current density has been measured for different excitation modes fixed by the loop antenna orientation. A current density of 1 mA/cm2 has been reached with an incident microwave power of 110 W and a chamber pressure of 9×10−3 mbar. The small dimensions of this ion source and its performance allow to use it not only in applications such as ion beam processing and cleaning or surface treatments in advanced microelectronics, but also as a neutralizer for ion deposition applications.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145075
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  • 2
    Electronic Resource
    Electronic Resource
    A microwave plasma cathode electron gun for ion beam neutralization : Proceedings of the 7th international conference on ion sources (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 1153-1155 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: It is well known that there exist two distinct types of ion beam neutralization, viz., charge and current neutralization. We have designed and studied a versatile and compact microwave plasma (MP) cathode electron gun dedicated to charge as well as current neutralization. Unlike the conventional hot cathode neutralizer, this MP cathode allows operation of the electron gun in a reactive gaseous environment when it is eventually associated with an electron cyclotron resonance (ECR) ion gun. Charge neutralization can be easily carried out by extracting from the MP cathode through a 1 mm diameter hole, a 35 mA electron beam under a 20 V voltage; the MP cathode being fed with a 75 W microwave power at 2.45 GHz. Higher beam intensities could be obtained using a multiaperture thin plate. Electron beam intensities as high as 300 mA and energies of 2 keV needed for current neutralization, e.g., when an ion beam impinges onto a thick dielectric surface, are obtained via a two-stage arrangement including an anodic chamber associated with a set of three monoaperture plates for the electron beam extraction. Transport of 200–2000 eV electron beams is ensured using focusing optics composed of three aligned tubes 6 cm in diameter and unsymmetrically polarized. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148654
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  • 3
    Electronic Resource
    Electronic Resource
    Radio frequency, microwave, and electron cyclotron resonance ion sources for industrial applications: A review (invited) : Proceedings of the 6th international conference on ion sources (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 895-900 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We recall the different classes of electromagnetic field excited ion sources and their characteristic features in the scope of industrial applications. Emphasis is laid on various criteria and conditions: long source lifetimes, intense inert or reactive ion beams free from contaminants, low process pressures, severe environmental conditions, reliability, possibility of automatic control, simplicity in handling, and maintenance. Examples of sources particularly suited to processes involving deposition or surface modification of materials are reviewed. Specific technological solutions and designs applied to these sources for industrial applications are examined. A few examples of applications using ion-beam processes in different fields (optics, microelectronics, and mechanics) are presented and further trends, especially for inline surface treatments, are examined. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146832
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  • 4
    Electronic Resource
    Electronic Resource
    A compact electron cyclotron resonance proton ion source : Proceedings of the 6th international conference on ion sources (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 994-996 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The demand has increased for a high-current, long lifetime ion source in various fields of application. The present work concerning the production of atomic hydrogen ions H+ in competition with molecular ions H+2 has been essentially motivated by recent trends in the field of passivation of silicon [V. Le Thanh, M. Eddrief, and C. A. Sébenne, Appl. Phys. Lett. 64, 3308 (1994)]. For a given low neutral energy, passivation with a neutral atomic beam H instead of H2 is preferred. The most straightforward method to produce the neutral beams is by the extraction of low energy atomic ions, and neutralization by electron capture. We have thus developed an electron cyclotron resonance coaxial hydrogen ion source that produces a 30-mm-diam ion beam, is operated with a microwave power in the range of 50–130 W, and has a pressure of neutrals in the range of 6×10−4–4×10−3 mbar. We have compared the proportion of extracted H+ and H+2 ions with the two principal parameters of the plasma: the pressure of neutrals and microwave injected power. These parameters have been optimized for the production of an 83% atomic ion beam. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146795
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  • 5
    Electronic Resource
    Electronic Resource
    Optimization of a two-stages electrostatic reflex ion source : Proceedings of 5th international conference on ion source (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1101-1103 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: In our argon, oxygen, or nitrogen broad beam ion source, 80 mm in diameter, which is either an electrostatic reflex ion source, or a magnetic and electrostatic reflex ion source, the hot filament has been replaced by a carefully optimized microwave plasma (MP) cathode under the electron cyclotron resonance condition. Different geometries of antennae in which the microwave transverse electric field is more or less favored have been tested. A major improvement was obtained when a dc polarization of these antennae was superimposed onto the microwave field, allowing a fine tuning via the sheath thickness adjustment. Registered cathode currents under various conditions of pressure of neutrals, microwave power, and polarization voltage have shown a gain of a factor of 3 relative to the previous case where the single disk antenna was at a floating potential. Best results with argon gas at a pressure of 3×10−2 mbar were obtained with a spear-head shaped antenna fed at a microwave power of 50 W and polarized at 26 V. Extracted ion beam current densities as high as 5 mA/cm2 resulted from these different MP cathode improvements. Moreover, we have shown that the internal electronic tuning of the source can advantageously replace the traditional external tuning.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145077
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  • 6
    Electronic Resource
    Electronic Resource
    An ECR microwave plasma cathode for ion sources with electrostatic reflex containment : Proceedings of the fourth International Conference on Ion Sources (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 2587-2589 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Ion sources for industrial reactors are used in a lot of applications such as ion beam sputtering or etching, ion assisted thin-film deposition, and surface treatment. They must satisfy several conditions; three of them are most important for reactive, especially oxygen, ion beams: (1) a lifetime longer than 100 h, (2) no deposition of an insulating film on the electrodes, (3) the electron energy must be chosen in a given range in order to control the fragmentation of the injected neutrals. The aim of this work was to compare the behavior of two ion sources having the same microwave plasma cathode, where the plasma is created by a microwave field (2.45 GHz) under an ECR condition: an electrostatic reflex ion source (ERIS) and a multipolar electrostatic reflex ion source (MERIS). Typically, we have produced an oxygen beam current of 83 mA with the ERIS structure and 118 mA with the MERIS structure, in 84 mm diameter for an extracted energy of 1200 eV. We have obtained broad uniform oxygen beams during about 100 h with both sources. A comparison between figures of the two structures is given, concerning the discharge characteristics, the extracted current, the yield, and finally, the extracted beam profile.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142898
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  • 7
    Electronic Resource
    Electronic Resource
    Electron cyclotron resonance applicator of the Wilkinson microwave power divider type for large diameter ion sources : Proceedings of the 7th international conference on ion sources (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 843-845 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We have designed and tested a new model of coaxial 2.45 GHz electron cyclotron resonance (ECR) ion source based on the splitting of the microwave power traveling along a coaxial line into a set of periodically distributed antennas. Our motivation was the study of the scaling-up feasibility of a coaxially fed ion source in which it is desirable to circumvent the transverse electric and magnetic (TEM) mode conversion into azimuthally unsymmetrical higher-order modes. Another important characteristic of this source is the possible incorporation of permanent magnets into the individual antennas in order to create the ECR zones around the latter. The validity of these concepts was tested on a 5 cm in external diameter coaxial ECR ion source in which the single thick coaxial antenna was replaced by a set of quarter wavelength magnetized rod antennas in order to enhance the magnetic field created by the external splitted ring magnets. For an incident power of 100 W and an argon pressure of 1.2×10−4 mbar, a 500 eV singly charged ion beam with a current density of 1 mA/cm2 was delivered through an accel-decel set of grids. Implementation of a scaled-up 20 cm in diameter ion source is in progress. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148578
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  • 8
    Electronic Resource
    Electronic Resource
    A slab-shaped electron cyclotron resonance ion beam source for in-line running target treatments : Proceedings of the 6th international conference on ion sources (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 1000-1002 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The possibility of industrial surface treatments of broad metallic rolls by appropriate ion beams has motivated our study of an immersed electron cyclotron resonance slab-shaped ion source composed of a number of elementary microwave modules fed in parallel through a linear power divider. We describe the performances of a single module implemented by a 45-mm-height ionization chamber of 80×15 mm cross section surrounded by a set of permanent magnets in a multipole configuration. A current density of 5 mA/cm2, uniform to within 10% over a 60 mm width, has been obtained for argon as well as for oxygen and nitrogen under a 500 W input power and a gas pressure of 5–8×10−3 mbar in the ionization chamber. Moreover, we have investigated the case of the non-normal incidence of the ion beam onto the running target. For 30° and 60° incidence angles with respect to the normal, the current density loss is 15% and 25%, respectively. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146796
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  • 9
    Electronic Resource
    Electronic Resource
    Beam extraction from ion sources with electrostatic containment : Proceedings of the fourth International Conference on Ion Sources (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 2762-2764 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Ion sources with electrostatic containment of the primary electrons are very attractive since they possess an upgraded ionization efficiency and are simple to realize. However, their plasma potential is quite different from the potential of the plasma electrode, which supports extraction apertures, resulting in a non-negligible space-charge sheath between the plasma and the extraction plane. An experimental comparative study of the extraction of an ion beam with and without electrostatic containment shows the influence of the space-charge sheath on the extracted ion beam characteristics. For the same extraction potential condition, the ion beam current is lowered when the ion source uses the electrostatic containment. For monoaperture applications, an improvement of the ERIS structure in which the anode is the extraction aperture itself has been tested. In this case, space-charge sheath effects in the extraction area are negligible and the matching conditions are much better than with a standard reflex structure. For multiaperture applications, space-charge sheath effects in the extraction area are reduced when the plasma grid is positively biased with respect to the cathode potential. Experimental results prove that this polarization permits to upgrade transmission of beamlets.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142797
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  • 10
    Electronic Resource
    Electronic Resource
    Modified distributed electron cyclotron resonance ion source for the production of large diameter ion beams (2001)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 72 (2001), S. 3816-3825 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The work presented in this article concerns the conception and the study of a multiantenna electron cyclotron resonance (ECR) ion source at 2.45 GHz dedicated to the surface treatment of large area materials. In this original device, a microwave plasma is created in a 20 cm in diameter ionization chamber. The 15 cm in diameter extracted ion beam has a current density of about 1 mA/cm2. The applicator is an N-way coaxial power divider in which the N=20 antennas are individually magnetized by internal SmCo bars in order to produce ECR zones in their vicinity. Moreover, the microwave plasma is confined by a multicusp magnetic structure surrounding the ionization chamber. The choice of the source geometry has been guided by the study of some theoretical considerations such as the characteristic diffusion length, the minimum breakdown field, and the penetration depth of the wave into the plasma. Simulations both of the electromagnetic field and the static magnetic field distribution have been carried out in order to validate the final choice of the source geometry. A full characterization of the ECR plasma and of the extracted ion beam was made with different experimental techniques. These results allow us to localize the plasma creation zones inside the ionization chamber. A 120 mA singly charged argon ion beam with a profile homogeneity better than ±5% over 10 cm was obtained 5 cm downstream the extraction system with a 300 W microwave power and a neutral argon pressure of 10−3 mbar in the ionizing chamber. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1396660
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