ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
Design features and preliminary performance data for an ion-implantation system that derives its broad, high-current-density beam directly from a steady, metal-plasma discharge in a high temperature graphite chamber are described. Metal vapor is supplied by drawing electron current to an anode-potential crucible to vaporize a pure metal in it. Argon used to start the discharge is turned off once sufficient metal vapor is present to sustain it. Extraction of metal-ion beams that are several centimeters in diameter at current densities ranging to several hundred μA/cm2 of titanium or copper onto targets 50 cm from the ion source is demonstrated. The system is simple, reliable, and easy to maintain.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1142922
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