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Enhanced photoemission of Ag–O–Cs composite thin films with an internal electric field (2001)

Zhang, Q. F. ; Liu, W. M. ; Xue, Z. Q. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 89 (2001), S. 2227-2231

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: Ag–O–Cs thin films with internal field-assisted structure were fabricated, and enhanced photoemission was observed when the internal electric field was applied to the thin films. The increase of photoelectronic quantum yield, corresponding to the applied 30 V bias, was about 15.7%, while the thin films were irradiated by the light with wavelength of 510 nm. From an analysis of the electric potential distribution in the Ag–O–Cs thin films with the applied internal electric field, it is found that the interfacial barrier between the Ag nanoparticles and the Cs2O matrix is decreased and the vacuum level at the surface is degraded. The calculated barrier curves for various applied biases are illustrated to show the thinning effect of internal electric field on the interfacial barrier width. The theoretical lowering of interfacial barrier height is obtained as 0.08 and 0.22 eV when the thin films are stimulated by applied bias of 1 and 30 V, respectively. Further, a group of formulas as well, based upon the electric potential distribution in the Ag–O–Cs thin films, is deduced to describe the relationship between the applied bias and the degradation of the surface vacuum level. The enhanced photoemission of Ag–O–Cs thin films is attributed to the field-induced variations in the energy band structure which are considered to result in the increased probabilities for the photoexcited electrons to travel through the interfacial barrier and escape into the vacuum. © 2001 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1334372

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Pyramiding of insect- and disease-resistance genes into an elite indica, cytoplasm male sterile restorer line of rice,‘Minghui 63′ (2004)

Jiang, G. H. ; Xu, C. G. ; Tu, J. M. ; [et al.]

Oxford, UK : Blackwell Publishing Ltd

Plant breeding 123 (2004), S. 0

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ISSN: 1439-0523

Source: Blackwell Publishing Journal Backfiles 1879-2005

Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition

Notes: The wild-rice-derived dominant gene Xa21 conferring multi-race resistance to bacterial blight and a fused Bt gene cry1Ab/cry1Ac conferring resistance to lepidopteran insects were individually introduced into the same genetic background of an elite indica cytoplasm male sterile (CMS) restorer line ‘Minghui 63′. The line showed the desirable insect- and disease-resistant phenotypes. To maximize the effect, the two genes were also pyramided into the same recipient plant of ‘Minghui 63’ by marker-assisted selection. After being subjected to natural infestation of leaf-folders and yellow stem borers and inoculation of Xoo strain mixtures, the pyramiding line and its derived hybrids showed high levels of resistance against both insect damage and disease. Furthermore, data from field trials demonstrated that the hybrids made by crossing this pyramiding line with the CMS lines ‘Zhenshan 97A’ and ‘Maxie A’ retained a similar level of yield under conditions without chemical spray, indicating that the pyramiding genes have a yield-stabilizing effect on the recipient line and its hybrids.