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    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Key engineering materials Vol. 329 (Jan. 2007), p. 151-156 
    ISSN: 1013-9826
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: The fundamental characteristics of dressing action on the polyurethane pad areinvestigated via dressing by single diamond of different orientations, dressing parameters anddressing path in this study. Experimental results show that a groove with pile-up on both side wallsforms as the diamond moves over the pad with a specific dressing depth. The resulting asperities onthe pad are strongly affected by the diamond orientation. Plowing is found to be the majormechanism responsible for this surface topology if dressing is conducted by the face of a diamond.On the contrary, cutting action dominates when the point of a diamond is responsible for dressing. Itis also found that dressing velocity has an insignificant effect on the groove and ridges created onthe pad. The depth of the groove is smaller than the dressing depth due to the spring back of the pad.When the groove created is repeatedly dressed over the same track, the ridge height and groovedepth increases for each additional dressing. When two grooves cross each other, the ridges at thefour corners of the intersection grow while the depth of the overlapped area decreases. These ridgeswill become the pressure enhancer of the abrasives to polish the wafer
    Type of Medium: Electronic Resource
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