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Effect of the reducing agent on the oxygen-inhibited layer of the cross-linked reline material (2001)

Yatabe, M. ; Seki, H. ; Shirasu, N. ; [et al.]

Oxford, UK : Blackwell Science Ltd

Journal of oral rehabilitation 28 (2001), S. 0

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ISSN: 1365-2842

Source: Blackwell Publishing Journal Backfiles 1879-2005

Topics: Medicine

Notes: The purpose of this study was to clarify the effect of the reducing agent on the oxygen-inhibited layer of the cross-linked reline material. A commercial autopolymerizing reline resin containing 1,6-hexanediol dimethacrylate as cross-linking agent and 1 wt.% sodium sulphite solution as a reducing agent was prepared. The inhibited layer was observed using an optical transmission microscope under the conditions of the application of sodium sulphite for 0, 1, 5 and 15 min after curing for 10 min in air. As a control, the reline material was cured on sealing from air. Moreover, the three-point flexural strength test was performed under the same conditions. The fracture was then observed using scanning electron microscopy (SEM). Although hardness of the inhibited layer was enhanced after the application of the reducing agent, the layer was still observed. The flexural strength of the control and the groups after application of the reducing agent was significantly higher than the group without reducing agent. SEM examination revealed many polymer beads on the group without reducing agent, whereas polymer beads could not be observed on the groups applying the reducing agent. These results indicated that the application of sodium sulphite was effective in hardening the surface unpolymerized zone.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1046/j.1365-2842.2001.00634.x

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Growth and characterization of YBa2Cu3Ox and NdBa2Cu3Ox superconducting thin films by mist microwave-plasma chemical vapor deposition using a CeO2 buffer layer (2000)

Takahashi, N. ; Koukitu, A. ; Seki, H.

Springer

Journal of materials science 35 (2000), S. 1231-1238

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ISSN: 1573-4803

Source: Springer Online Journal Archives 1860-2000

Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics

Notes: Abstract Superconducting thin films of YBa2Cu3Ox (YBaCuO) and NdBa2Cu3Ox (NdBaCuO) were grown by mist microwave-plasma chemical vapor deposition (MPCVD) using a CeO2 buffer layer on a MgO (001) substrate. In this method, the CeO2 buffer layer was deposited on the MgO (001) substrate at 1173 K by MPCVD. YBaCuO and NdBaCuO films were then grown at 1073 K and 1223 K, respectively. The Tc (zero resistance) values of the YBaCuO and NdBaCuO films obtained with a CeO2 buffer layer were 90.1 K and 94.1 K, respectively, about 10 K higher than those without a CeO2 buffer layer. The surface roughness of the films was less than 5 nm in each case. The interface between the substrate and the grown layer was confirmed to be extremely sharp by Auger profile analysis.