ISSN:
0948-1907
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The Selective chemical vapor deposition (CVD) of metals from metal-containing compounds is reviewed and the approaches taken are classified according to the different physicochemical phenomena which take place on the growth and non-growth surfaces. These include: an intrinsic difference in reaction rates, sacrificial solid-state co-reactant, activation of the growth surface, radiation-induced activation of the growth surface, passivation of non-growth surfaces, and a physical nucleation barrier. The results from the literature suggest that surface modification, in which the growth surface is activated or the non-growth surface is passivated, is a promising method to control selectivity. However, few results are available from experiments with well-characterized surfaces, making meaningful comparisons of the origin of selective CVD difficult to interpret.
Additional Material:
12 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/cvde.19950010202
Permalink