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  • 1995-1999  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 8982-8992 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The ion energy distributions (IEDs) at the electrodes in a capacitively coupled 13.56 MHz plasma in CF4 have been measured mass resolved with a Balzers quadrupole in combination with a home-built energy analyzer. Mass-resolved determination offers the possibility to compare the IED of different ions achieved in the same sheath. The IEDs have been determined at both the largest and the smallest electrode. Apart from the IEDs of the CF4 species, the IEDs of ionic species in plasmas in argon and nitrogen also were determined. Apart from the CF4 ionic species CF+3, CF+2, CF+, and F+, CHF+2 ions also are present in the CF4 plasma due to residual water in the reactor. Because the CHF+2 ions are not produced in the sheath and because we do not detect elastically scattered ions, the IEDs of these ions show the typical bimodal distribution for rf plasmas which corresponds to an IED of ions which have not collided in the sheath. From these IEDs we can obtain the sheath characteristics, such as the averaged sheath potential. From the IEDs of CF+n ions one can conclude that, in the sheath of the CF4 plasma, a large number of chemical reactions takes place between the CF+n ions and the neutrals. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 4867-4872 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The average electron density and electron density fluctuations in a dusty Ar/SiH4 rf discharge have been studied using a microwave resonance technique. The average electron density increases with rf input power and it has a maximum as a function of pressure at about 30 mTorr. Within the first second of plasma operation the electron density decreases with a factor of ten. This is caused by submicroscopic particles, formed in the discharge, which rapidly absorb electrons. When the particles reach a critical size they are expelled from the plasma. This process is governed by a balance between the Coulomb force, trapping the particles in the positive plasma glow and the neutral drag force, flushing them out. The periodic growth and expulsion of particles, monitored by light scattering, results in an oscillatory behavior of the electron density. From the measured oscillation period (τ), which is in the order of seconds to minutes, and its dependence on the gas flow rate (F) and on the fraction α of SiH4 in the plasma (τ[s]≈4.5×102α−1F−2 [sccm], at 10 W rf power input), the trapping force (FC) on particles can be calculated: FC[N]≈4×10−18r [nm], where r is the radius of a particle. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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