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  • 1995-1999  (2)
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Year
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 389-392 
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract Electron probe microanalysis (EPMA) at low electron energies (typically 3–10 keV) has been used to study the composition of coatings with a film thickness of 0.1–1.3 μm (“bulk” analysis). The accuracy of quantification, including the most critical situation of low atomic number elements (boron–oxygen), is about 5% relative by use of pure element or arbitrary compound standards. A special procedure of data processing (“thin film” analysis) enables the simultaneous determination of film thickness and composition, provided that the substrate is known. The film thickness may be in the range of 2 nm to 5 μm. EPMA can be also applied in the mode of “non-destructive in-depth analysis”, which is based on the combined evaluation of experiments at different electron energies. The quantitative characterization of layered structures and implantation zones is demonstrated.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 389-392 
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract Electron probe microanalysis (EPMA) at low electron energies (typically 3–10 keV) has been used to study the composition of coatings with a film thickness of 0.1–1.3 μm (“bulk” analysis). The accuracy of quantification, including the most critical situation of low atomic number elements (boron-oxygen), is about 5% relative by use of pure element or arbitrary compound standards. A special procedure of data processing (“thin film” analysis) enables the simultaneous determination of film thickness and composition, provided that the substrate is known. The film thickness may be in the range of 2 nm to 5 μm. EPMA can be also applied in the mode of “non-destructive in-depth analysis”, which is based on the combined evaluation of experiments at different electron energies. The quantitative characterization of layered structures and implantation zones is demonstrated.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
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